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Machine translation
1. (WO2007091560) PHOTOSENSITIVE RESIN COMPOSITION AND PHOTORESIST FILM USING THE SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/091560    International Application No.:    PCT/JP2007/052029
Publication Date: 16.08.2007 International Filing Date: 06.02.2007
IPC:
G03F 7/033 (2006.01), C08F 290/06 (2006.01), G03F 7/004 (2006.01), G03F 7/027 (2006.01), G03F 7/031 (2006.01)
Applicants: Nichigo-Morton Co., Ltd. [JP/JP]; 1-88, Oyodonaka 1-chome, Kita-ku, Osaka-shi, Osaka5310076 (JP) (For All Designated States Except US).
MURAKAMI, Shigeru; (For US Only).
HAMADA, Yasuhiro; (For US Only).
YAMAMOTO, Takatoshi; (For US Only).
HINATA, Atsuyoshi; (For US Only)
Inventors: MURAKAMI, Shigeru; .
HAMADA, Yasuhiro; .
YAMAMOTO, Takatoshi; .
HINATA, Atsuyoshi;
Agent: NAITO, Teruo; Shin-ei Patent Office, 7-13, Nishi-Shimbashi 1-chome Minato-ku, Tokyo 1050003 (JP)
Priority Data:
2006-030470 08.02.2006 JP
Title (EN) PHOTOSENSITIVE RESIN COMPOSITION AND PHOTORESIST FILM USING THE SAME
(FR) COMPOSITION DE RÉSINE PHOTOSENSIBLE ET FILM DE RÉSERVE PHOTOSENSIBLE UTILISANT CELLE-CI
(JA) 感光性樹脂組成物及びそれを用いたフォトレジストフィルム
Abstract: front page image
(EN)Disclosed are: a photosensitive resin composition having excellent resolving power, contact stability and resist stripping properties; and a photoresist film. The photosensitive resin composition comprises a polymer having a carboxyl group (A), an ethylenically unsaturated compound (B) and a photopolymerization initiator (C). The polymer having a carboxyl group (A) is a copolymer having methacrylic acid (a1), a vinyl monomer having a phenyl group (a2) and a compound represented by the formula (1) (a3) as the copolymerization components, wherein the content of the component (a1) is 22 to 35% by weight and the content of the component (a2) is 20 to 35% by weight, both relative to the total amount of the copolymerization components.
(FR)L'invention concerne : une composition de résine photosensible ayant d'excellentes propriétés de pouvoir de résolution, de stabilité du contact et de décapage ; et un film de réserve photosensible. La composition de résine photosensible comprend un polymère ayant un groupe carboxyle (A), un composé à insaturation éthylénique (B) et un initiateur de photopolymérisation (C). Le polymère ayant un groupe carboxyle (A) est un copolymère ayant un monomère acide méthacrylique (a1), un monomère vinylique ayant un groupe phényle (a2) et un composé représenté par la formule (1) (a3) en tant que composants copolymérisés, la teneur du composant (a1) étant de 22 à 35 % en poids et la teneur du composant (a2) étant de 20 à 35 % en poids, toutes deux par rapport à la quantité totale des composants copolymérisés.
(JA) 解像力、密着安定性、レジスト剥離性に優れた感光性樹脂組成物及びフォトレジストフィルムを提供すること。カルボキシル基含有ポリマー(A)、エチレン性不飽和化合物(B)、及び光重合開始剤(C)を含有する感光性樹脂組成物であって、カルボキシル基含有ポリマー(A)が、メタクリル酸(a1)、フェニル基含有ビニル系単量体(a2)、及び下記(1)式で示される化合物(a3)を、共重合成分として含む共重合体であり、全共重合成分に対し(a1)の含有量が22~35重量%で、(a2)の含有量が20~35重量%であることを特徴とする感光性樹脂組成物。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)