WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2007086489) CAPACITIVE PRESSURE SENSOR
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/086489    International Application No.:    PCT/JP2007/051224
Publication Date: 02.08.2007 International Filing Date: 26.01.2007
IPC:
G01L 1/14 (2006.01), G01L 9/00 (2006.01), H01L 29/84 (2006.01)
Applicants: ALPS ELECTRIC CO., LTD. [JP/JP]; 1-7, Yukigaya otsukamachi, Ota-ku, Tokyo 1458501 (JP) (For All Designated States Except US).
TAMURA, Manabu [JP/JP]; (JP) (For US Only).
ABE, Akihiro [JP/JP]; (JP) (For US Only)
Inventors: TAMURA, Manabu; (JP).
ABE, Akihiro; (JP)
Agent: AOKI, Hiroyoshi; 7F, Nibancho Cashew Bldg. 4-3, Niban-cho, Chiyoda-ku Tokyo 1020084 (JP)
Priority Data:
2006-020456 30.01.2006 JP
Title (EN) CAPACITIVE PRESSURE SENSOR
(FR) CAPTEUR DE PRESSION CAPACITIF
(JA) 静電容量型圧力センサ
Abstract: front page image
(EN)A fixed electrode (3) is formed on a silicon substrate (1) through an insulating layer (2). The fixed electrode (3) constitutes a plurality of comb teeth (3a) extending in the normal direction of the major surface of the silicon substrate (1), and containing regions (3b) into which the projecting portions of a movable electrode can be inserted freely. A movable electrode (6) is provided on the fixed electrode (3) through insulating layers (4, 5). The movable electrode (6) has a plurality of comb teeth (6a) projecting to the fixed electrode (3) side. The movable electrode (6) is displaced upwardly or downwardly by pressure and the comb teeth (6a) are inserted into the regions (3b) between the comb teeth (3a) of the fixed electrode (3). Consequently, the opposing area between the movable electrode (6) and the fixed electrode (3) is varied. Since S in the formula: C=ϵS/d varies in proportion to the pressure, the capacitance varies linearly.
(FR)Une électrode fixe (3) est formée sur un substrat en silicium (1) à travers une couche isolante (2). L’électrode fixe (3) constitue une pluralité de dents de peigne (3a) qui s’étendent dans la direction normale de la surface principale du substrat en silicium (1), et contiennent des régions (3b) dans lesquelles viennent se loger librement les parties protubérantes d’une électrode mobile (6). L’électrode mobile (6) est formée sur l’électrode fixe (3) à travers des couches isolantes (4, 5) et comporte une pluralité de dents de peigne (6a) qui font saillie du côté de l’électrode fixe (3). L’électrode mobile (6) se déplace vers le haut ou vers le bas par application d’une pression et les dents de peigne (6a) s’insèrent dans les régions (3b) entre les dents de peigne (3a) de l’électrode fixe (3), ce qui permet de faire varier la surface opposée entre l’électrode mobile (6) et l’électrode fixe (3). Dans le formule C = ϵS/d, S varie proportionnellement à la pression, si bien que la capacité C varie linéairement.
(JA)シリコン基板1上には絶縁層2を介して固定電極3が形成されている。この固定電極3は、シリコン基板1の主面の法線方向に延在する複数の櫛歯3a及び可動電極の突出部が挿入自在となる収容領域3bを構成する。固定電極3上には、絶縁層4,5を介して可動電極6が設けられている。可動電極6は、固定電極3側に突出する複数の櫛歯6aを有する。可動電極6は、圧力により上下に変位して、櫛歯6aが固定電極3の櫛歯3aの間の領域3b内に挿入される。これにより、可動電極6と固定電極3との間の対向面積が変化する。すなわち、C=εS/dの式におけるSが圧力に比例して変化するので、静電容量の変化が直線的に変化することになる。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)