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Machine translation
1. (WO2007080707) SUBSTRATE CLEANING APPARATUS, METHOD OF SUBSTRATE CLEANING, SUBSTRATE TREATING SYSTEM AND RECORDING MEDIUM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/080707    International Application No.:    PCT/JP2006/323114
Publication Date: 19.07.2007 International Filing Date: 20.11.2006
IPC:
H01L 21/304 (2006.01)
Applicants: TOKYO ELECTRON LIMITED [JP/JP]; 3-6, Akasaka 5-chome, Minato-ku, Tokyo 1078481 (JP) (For All Designated States Except US).
MATSUMOTO, Kazuhisa [JP/JP]; (JP) (For US Only)
Inventors: MATSUMOTO, Kazuhisa; (JP)
Agent: YOSHITAKE, Kenji; Kyowa Patent & Law Office, Room 323, Fuji Bldg., 2-3, Marunouchi 3-chome, Chiyoda-ku Tokyo 1000005 (JP)
Priority Data:
2006-002234 10.01.2006 JP
Title (EN) SUBSTRATE CLEANING APPARATUS, METHOD OF SUBSTRATE CLEANING, SUBSTRATE TREATING SYSTEM AND RECORDING MEDIUM
(FR) APPAREIL ET PROCEDE DE NETTOYAGE DE SUBSTRAT, SYSTEME DE TRAITEMENT DE SUBSTRAT ET SUPPORT D’ENREGISTREMENT
(JA) 基板洗浄装置、基板洗浄方法、基板処理システムならびに記録媒体
Abstract: front page image
(EN)Substrate cleaning apparatus (40) including cleaning vessel (70), holding table (51) rotatably disposed within the cleaning vessel (70) and adapted to retain treatment object substrate (W), and rotary drive member (52) for rotating of the holding table (51). Chemical liquid storage member (53) for retention of a chemical liquid along the periphery of the treatment object substrate (W) held by the holding table (51) and for immersion of the periphery of the treatment object substrate (W) in the chemical liquid is disposed lateral to the circumference of the holding table (51). Chemical liquid supply member (54) for supply of the chemical liquid to the chemical liquid storage member (53) is connected to the chemical liquid storage member (53). Further, there is provided brush (55d) for polishing the periphery of the treatment object substrate (W) held by the holding table (51).
(FR)La présente invention concerne l’appareil de nettoyage de substrat (40) comprenant un récipient de nettoyage (70), un panneau de maintien (51) disposé de manière rotative dans le récipient de nettoyage (70) et adapté de façon à maintenir le substrat objet du traitement (W), et un élément à entraînement rotatif (52) destiné à mettre en rotation le panneau de maintien (51). L’élément de stockage de liquide chimique (53) destiné à retenir un liquide chimique le long de la périphérie du substrat objet du traitement (W) maintenu sur le panneau de maintien (51) et destiné à l'immersion de la périphérie du substrat objet du traitement (W) dans le liquide chimique est disposée de manière latérale à la circonférence du panneau de maintien (51). Un élément d’alimentation en liquide chimique (54) destiné à alimenter en liquide chimique l’élément de stockage de liquide chimique (53) est relié à l’élément de stockage de liquide chimique (53). En outre, la présente invention concerne une brosse (55d) destinée à polir la périphérie du substrat objet du traitement (W) maintenu par le panneau de maintien (51).
(JA)not available
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)