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Machine translation
1. (WO2007078376) SPUTTERING METHOD AND APPARATUS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/078376    International Application No.:    PCT/US2006/040557
Publication Date: 12.07.2007 International Filing Date: 16.10.2006
IPC:
C23C 14/04 (2006.01), C23C 14/35 (2006.01), C23C 14/08 (2006.01)
Applicants: GENERAL ELECTRIC COMPANY [US/US]; ( A NEW YORK CORPORATION), 1 River Road, Schenectady, NY 12345 (US) (For All Designated States Except US).
YAN, Min [CN/US]; (US) (For US Only).
ERLAT, Ahmet, Gun [TR/US]; (US) (For US Only).
LIU, Jie [CN/US]; (US) (For US Only)
Inventors: YAN, Min; (US).
ERLAT, Ahmet, Gun; (US).
LIU, Jie; (US)
Agent: WINTER, Catherine, J.; GENERAL ELECTRIC COMPANY, Global Patent Operation, 187 Danbury Road, Suite 204, Wilton, CT 06897 (US)
Priority Data:
11/316,267 22.12.2005 US
Title (EN) SPUTTERING METHOD AND APPARATUS
(FR) PROCEDE ET APPAREIL DE PULVERISATION
Abstract: front page image
(EN)A method and system for DC magnetron sputtering deposition of films on plastic substrates. The method includes using a shield (24) to block deposition in a spatial region (28) corresponding to a plasma region formed during magnetron sputtering. An optoelectronic device including an amorphous electrode film is also disclosed.
(FR)La présente invention concerne un procédé et un système de dépôt par pulvérisation magnétron DC de films sur des substrats de plastique. Ce procédé consiste à utiliser un écran (24) pour bloquer le dépôt dans une région spatiale (28) correspondant à une région plasma formée durant la pulvérisation magnétron. Cette invention concerne aussi un dispositif optoélectronique comprenant un film électrode amorphe.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)