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1. WO2007058016 - PROCESS FOR PRODUCING BASE MATERIAL FOR FORMING HEAT SHIELDING FILM

Publication Number WO/2007/058016
Publication Date 24.05.2007
International Application No. PCT/JP2006/318740
International Filing Date 21.09.2006
Chapter 2 Demand Filed 05.04.2007
IPC
B05D 1/36 2006.1
BPERFORMING OPERATIONS; TRANSPORTING
05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
DPROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
1Processes for applying liquids or other fluent materials
36Successively applying liquids or other fluent materials, e.g. without intermediate treatment
C09D 5/33 2006.1
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
5Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
33Radiation-reflecting paints
C09D 7/12 2006.1
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
7Features of coating compositions, not provided for in group C09D5/88; Processes for incorporating ingredients in coating compositions
12Other additives
C09D 183/04 2006.1
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
183Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
04Polysiloxanes
CPC
C03C 17/008
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
17Surface treatment of glass, not in the form of fibres or filaments, by coating
006with materials of composite character
008comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
C03C 17/009
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
17Surface treatment of glass, not in the form of fibres or filaments, by coating
006with materials of composite character
008comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
009Mixtures of organic and inorganic materials, e.g. ormosils and ormocers
C03C 17/30
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
17Surface treatment of glass, not in the form of fibres or filaments, by coating
28with organic material
30with silicon-containing compounds
C03C 2217/445
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
2217Coatings on glass
40Coatings comprising at least one inhomogeneous layer
43consisting of a dispersed phase in a continuous phase
44characterized by the composition of the continuous phase
445Organic continuous phases
C03C 2217/452
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
2217Coatings on glass
40Coatings comprising at least one inhomogeneous layer
43consisting of a dispersed phase in a continuous phase
44characterized by the composition of the continuous phase
45Inorganic continuous phases
452Glass
C03C 2217/475
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
2217Coatings on glass
40Coatings comprising at least one inhomogeneous layer
43consisting of a dispersed phase in a continuous phase
46characterized by the dispersed phase
47consisting of a specific material
475Inorganic materials
Applicants
  • セントラル硝子株式会社 CENTRAL GLASS COMPANY, LIMITED [JP]/[JP] (AllExceptUS)
  • 斎藤 真規 SAITO, Masanori (UsOnly)
  • 濱口 滋生 HAMAGUCHI, Shigeo (UsOnly)
  • 赤松 佳則 AKAMATSU, Yoshinori (UsOnly)
  • 公文 創一 KUMON, Soichi (UsOnly)
Inventors
  • 斎藤 真規 SAITO, Masanori
  • 濱口 滋生 HAMAGUCHI, Shigeo
  • 赤松 佳則 AKAMATSU, Yoshinori
  • 公文 創一 KUMON, Soichi
Agents
  • 橋本 剛 HASHIMOTO, Takeshi
Priority Data
2005-33006415.11.2005JP
2006-05466201.03.2006JP
2006-18622206.07.2006JP
2006-24364908.09.2006JP
Publication Language Japanese (ja)
Filing Language Japanese (JA)
Designated States
Title
(EN) PROCESS FOR PRODUCING BASE MATERIAL FOR FORMING HEAT SHIELDING FILM
(FR) PROCESSUS DE PRODUCTION D'UN MATERIAU DE BASE POUR LA FORMATION D'UN FILM DE PROTECTION THERMIQUE
(JA) 熱線遮蔽膜形成基材の製法
Abstract
(EN) A process for producing a base material for forming a heat shielding film, comprising the step of mixing a sol solution formed from trialkoxysilane, or trialkoxysilane and tetraalkoxysilane, as a starting raw material with a solution in which tin-doped indium oxide superfine particles are dispersed to thereby prepare a treatment agent and the coating step of coating a base material with the treatment agent. In this process, the treatment agent comprises, as a dispersion medium, an organic solvent with a boiling point of 100 to 200°C. The coating in the coating step is performed by bringing a member holding the treatment agent into contact with the base material, or spraying the treatment agent onto the base material, to thereby cause the haze value of formed film to be 0.5% or less.
(FR) Processus de production d'un matériau de base pour la formation d'un film de protection thermique, comportant l'étape consistant à mélanger une solution à l'état de sol formée de trialcoxysilane ou de trialcoxysilane et de tétraalcoxysilane, faisant fonction de matière première de départ, à une solution dans laquelle sont dispersées des particules superfines d'oxyde d'indium dopé à l'étain, afin de préparer ainsi un agent de traitement, et l'étape consistant à revêtir un matériau de base à l'aide de l'agent de traitement. Dans ce processus, l'agent de traitement comprend, en tant que milieu de dispersion, un solvant organique présentant un point d'ébullition de 100 à 200°C. L'étape de revêtement est réalisée en amenant un organe contenant l'agent de traitement au contact du matériau de base ou en pulvérisant l'agent de traitement sur le matériau de base afin d'obtenir ainsi une valeur de voile du film formé inférieure ou égale à 0,5%.
(JA)  トリアルコキシシラン又はトリアルコキシシランとテトラアルコキシシランとを出発原料として形成されたゾル溶液、及び錫ドープ酸化インジウム超微粒子が分散された溶液とを混合して処理剤とする工程、及び処理剤を基材に塗布する塗布工程を有する熱線遮蔽膜形成基材の製法が提供される。この製法において、前記処理剤は、沸点が100乃至200°Cの有機溶媒を分散媒として有する処理剤とし、前記塗布工程での塗布を、処理剤を保持した部材を基材に接触させる手段とすること、又は処理剤の噴霧による手段とすることで、形成される膜のヘーズ値を0.5%以下とする。
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