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1. WO2007026545 - PLASMA DISCHARGE PROCESSING DEVICE AND PRODUCTION METHOD OF GAS BARRIER FILM

Publication Number WO/2007/026545
Publication Date 08.03.2007
International Application No. PCT/JP2006/316139
International Filing Date 17.08.2006
IPC
C23C 16/54 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44characterised by the method of coating
54Apparatus specially adapted for continuous coating
C23C 16/50 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44characterised by the method of coating
50using electric discharges
CPC
C23C 16/45595
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
44characterised by the method of coating
455characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
45595Atmospheric CVD gas inlets with no enclosed reaction chamber
C23C 16/517
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
44characterised by the method of coating
50using electric discharges
517using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
C23C 16/545
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
44characterised by the method of coating
54Apparatus specially adapted for continuous coating
545for coating elongated substrates
H01J 37/3277
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32431Constructional details of the reactor
32733Means for moving the material to be treated
32752for moving the material across the discharge
32761Continuous moving
3277of continuous material
Applicants
  • コニカミノルタホールディングス株式会社 Konica Minolta Holdings, Inc. [JP]/[JP] (AllExceptUS)
  • 尾▲崎▼ 浩司 OZAKI, Koji [JP]/[JP] (UsOnly)
  • 福田 和浩 FUKUDA, Kazuhiro [JP]/[JP] (UsOnly)
  • 有田 浩了 ARITA, Hiroaki [JP]/[JP] (UsOnly)
Inventors
  • 尾▲崎▼ 浩司 OZAKI, Koji
  • 福田 和浩 FUKUDA, Kazuhiro
  • 有田 浩了 ARITA, Hiroaki
Priority Data
2005-25101331.08.2005JP
2005-25101431.08.2005JP
2005-36162515.12.2005JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) PLASMA DISCHARGE PROCESSING DEVICE AND PRODUCTION METHOD OF GAS BARRIER FILM
(FR) DISPOSITIF DE TRAITEMENT PAR DÉCHARGE DE PLASMA ET PROCÉDÉ DE FABRICATION D'UN FILM DE PROTECTION CONTRE LE GAZ
(JA) プラズマ放電処理装置及びガスバリア性フィルムの製造方法
Abstract
(EN)
A high-function film producing method reduced in surface trouble and improved in yield, and a producing device therefor. This producing device is a plasma discharge processing system for performing plasma discharge processing on the surface of a base material continuously transferred between a winder and an unwinder at the atmospheric pressure or at a pressure in the vicinity thereof, characterized in that the surface to be processed of the base material is transferred between the winder and the unwinder without contacting anything except for nip rollers isolating a discharge portion from the outside. A method of producing a gas barrier film being reduced in surface trouble (cracking trouble) when a gas barrier thin film is formed and having a high gas barrier property, characterized by providing a radius of surface curvature during transferring of at least 75 mm on the gas barrier thin film side of a formed gas barrier film and a radius of surface curvature of at least 37.5 mm on the opposite side thereof.
(FR)
Procédé de fabrication d'un film hautement fonctionnel présentant des problèmes superficiels réduit et un rendement amélioré et dispositif de fabrication de celui-ci. Ce dispositif de fabrication est un système de traitement par décharge de plasma permettant de réaliser un traitement par décharge de plasma à la surface d’un matériau de base transféré en continu entre un enrouleur et un dérouleur à la pression atmosphérique ou à une pression voisine de celle-ci, caractérisé en ce que la surface à traiter du matériau de base est transférée entre l’enrouleur et le dérouleur sans toucher autre chose que des galets pinceurs isolant une portion de décharge de l’extérieur. L'invention concerne un procédé de fabrication d’un film de protection contre le gaz présentant des problèmes superficiels réduits (problème de craquage) lorsqu’un film mince de protection contre le gaz est formé et ayant une propriété élevée de protection contre le gaz, caractérisé en ce qu'il fournit un rayon de courbure superficielle pendant le transfert d’au moins 75 mm sur le côté film mince de protection contre le gaz d’un film de protection contre le gaz formé et un rayon de courbure superficielle d’au moins 37,5 mm sur le côté opposé celui-ci.
(JA)
 本発明は、表面故障を低減させ、収率が向上した高機能フィルムの製造方法及びそのための製造装置を提供する。この製造装置は、ワインダ、アンワインダ間を連続的に移送する基材の表面を、大気圧もしくはその近傍の圧力下、プラズマ放電処理するプラズマ放電処理装置であって、ワインダ、アンワインダ間にあって、前記基材の被処理面が、放電部を外部と隔てるニップローラ以外には無接触で搬送されるプラズマ放電処理装置であることを特徴とする。  また、ガスバリア性薄膜形成時の表面故障(ひび割れ故障)が低減され、高いガスバリア性を備えたガスバリア性フィルムの製造方法を提供するものであり、これは、形成されたガスバリア性フィルムのガスバリア性薄膜側の、搬送中の曲率半径を75mm以上、反対側の面の曲率半径を37.5mm以上とすることを特徴とする。
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