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1. WO2007025643 - HIGH-NA PROJECTION OBJECTIVE WITH ASPHERIC LENS SURFACES

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Publication Number WO/2007/025643
Publication Date 08.03.2007
International Application No. PCT/EP2006/007963
International Filing Date 11.08.2006
IPC
G02B 17/08 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
17Systems with reflecting surfaces, with or without refracting elements
08Catadioptric systems
G03F 7/00 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
CPC
G02B 17/0812
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
17Systems with reflecting surfaces, with or without refracting elements
08Catadioptric systems
0804using two curved mirrors
0812off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
G02B 17/0892
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
17Systems with reflecting surfaces, with or without refracting elements
08Catadioptric systems
0892specially adapted for the UV
G03F 7/70225
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70225Catadioptric systems, i.e. documents describing optical design aspect details
G03F 7/70275
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70275Multiple projection paths, array of projection systems, microlens projection systems, tandem projection systems
G03F 7/70341
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70341Immersion
Applicants
  • CARL ZEISS SMT AG [DE]/[DE] (AllExceptUS)
  • SCHUSTER, Karl-Heinz [DE]/[DE] (UsOnly)
Inventors
  • SCHUSTER, Karl-Heinz
Agents
  • PATENTANWÄLTE RUFF, WILHELM, BEIER, DAUSTER & PARTNER
Priority Data
60/712,14130.08.2005US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) HIGH-NA PROJECTION OBJECTIVE WITH ASPHERIC LENS SURFACES
(FR) OBJECTIF DE PROJECTION A OUVERTURE NUMERIQUE (NA) ELEVEE COMPRENANT DES SURFACES DE LENTILLES ASPHERIQUES
front page image
Abstract
(EN)
A projection objective for imaging a pattern provided in an object surface onto an image surface of the projection objective has an object-side imaging subsystem for creating a final intermediate image closest to the image surface from radiation coming from the object surface and an image-side imaging subsystem for directly imaging the final intermediate image onto the image surface. The the image-side imaging subsystem includes at least one aspheric primary correcting lens having an aspheric primary correcting surface. The object-side imaging subsystem includes a secondary correcting group having at least one secondary correcting lens having an aspheric secondary correcting surface. Conditions involving maximum incidence angles and subaperture offsets at the correcting surfaces are given which should be observed to obtain sufficient aberration correction at very high image-side numerical apertures NA.
(FR)
L'invention concerne un objectif de projection destiné à former, sur une surface image de l'objectif de projection, l'image d'un motif formé à la surface d'un objet, lequel objectif de projection comprend un sous-système d'imagerie côté objet destiné à créer une image intermédiaire finale la plus proche de la surface image à partir du rayonnement venant de la surface de l'objet, et un sous-système d'imagerie côté image destiné à former directement une image de l'image intermédiaire finale sur la surface image. Le sous-système d'imagerie côté image comprend au moins une lentille de correction primaire asphérique possédant une surface de correction primaire asphérique. Le sous-système d'imagerie côté image comprend également un groupe de correction secondaire comportant au moins une lentille de correction secondaire possédant une surface de correction secondaire asphérique. Des conditions portant sur des décalages de sous-ouvertures et des angles d'incidence maximaux sur les surfaces de correction doivent être remplies pour obtenir une correction d'aberration suffisante à des valeurs d'ouvertures numériques (NA) côté image élevées.
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