WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2007022275) SIOX:SI SPUTTERING TARGETS AND METHOD OF MAKING AND USING SUCH TARGETS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/022275    International Application No.:    PCT/US2006/031994
Publication Date: 22.02.2007 International Filing Date: 11.08.2006
IPC:
C23C 14/00 (2006.01), C23C 14/10 (2006.01), C23C 14/14 (2006.01), C23C 14/34 (2006.01), H01L 21/31 (2006.01)
Applicants: WINTEK ELECTRO-OPTICS CORPORATION [US/US]; 1665 E Highland Drive, Ann Arbor, MI 48108 (US) (For All Designated States Except US).
STEVENSON, David, E. [US/US]; (US) (For US Only).
ZHOU, Li, Q. [CN/US]; (US) (For US Only)
Inventors: STEVENSON, David, E.; (US).
ZHOU, Li, Q.; (US)
Agent: STEARNS, Robert, L.; Dickinson Wright PLLC, 38525 Woodward Avenue, Suite 2000, Bloomfield Hills, MI 48304-5092 (US)
Priority Data:
11/201,782 11.08.2005 US
Title (EN) SIOX:SI SPUTTERING TARGETS AND METHOD OF MAKING AND USING SUCH TARGETS
(FR) CIBLES DE PULVERISATION CATHODIQUE DE SIOX:SI ET LEURS PROCEDES D'ELABORATION ET D'UTILISATION
Abstract: front page image
(EN)Silicon oxide and electrically conductive doped silicon materials are fused in a protective environment to yield a composite SiO2:Si material that exhibits the properties of SiO2, and yet is electrically conductive due to the presence of the Si. Such a composite material finds use as a target for DC and/or AC sputtering processes to produce conductive silicon oxide thin films for touch-screen applications and the like.
(FR)On fond de l'oxyde de silicium et des matériaux de silicium électroconducteurs dopés dans un environnement protecteur pour obtenir un composite de SiO2:Si qui présente les propriétés du SiO2, mais qui doit sa conduction électrique au Si. Un tel composite peut s'utiliser comme cible dans des processus de pulvérisation cathodique c.c. et c.a. pour produire des couches minces d'écrans à effleurement ou d'autres applications analogues.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)