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Machine translation
1. (WO2007022124) NOVEL POSITIVE PHOTOSENSITIVE POLYBENZOXAZOLE PRECURSOR COMPOSITIONS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/022124    International Application No.:    PCT/US2006/031725
Publication Date: 22.02.2007 International Filing Date: 15.08.2006
Chapter 2 Demand Filed:    31.01.2007    
IPC:
G03F 7/004 (2006.01), G03F 7/039 (2006.01), G03F 7/075 (2006.01)
Applicants: FUJIFILM ELECTRONIC MATERIALS U.S.A, INC. [US/US]; 80 Circuit Drive, North Kingstown, RI 02852 (US) (For All Designated States Except US).
NAIINI, Ahmad, A. [US/US]; (US) (For US Only).
POWELL, David, B. [US/US]; (US) (For US Only).
RACICOT, Donald, W. [US/US]; (US) (For US Only).
RUSHKIN, Ii'ya [US/US]; (US) (For US Only).
WEBER, William [US/US]; (US) (For US Only)
Inventors: NAIINI, Ahmad, A.; (US).
POWELL, David, B.; (US).
RACICOT, Donald, W.; (US).
RUSHKIN, Ii'ya; (US).
WEBER, William; (US)
Agent: Marc M. Wefers, Ph.D., J.D.; Fish & Richardson P.C., P.A., 60 South Sixth Street, Suite 3300, Minneapolis, Minnesota 55440-1022 (US)
Priority Data:
60/708,994 17.08.2005 US
60/810,611 02.06.2006 US
11/500,251 07.08.2006 US
Title (EN) NOVEL POSITIVE PHOTOSENSITIVE POLYBENZOXAZOLE PRECURSOR COMPOSITIONS
(FR) NOUVELLES COMPOSITIONS PRECURSEURS DE POLYBENZOXAZOLE PHOTOSENSIBLES POSITIVES
Abstract: front page image
(EN)A heat resistant positive-working photosensitive PBO precursor composition comprising: (a) at least one polybenzoxazole precursor polymer; (a) at least one plasticizer compound; (b) at least one solvent; wherein the amount of the plasticizer p resent i n the composition is an amount effective to reduce the sidewall angle of imaged and cured features in the coated film on the substrate to prevent stress failures in subsequent metallization of the substrate due to steep angles of the imaged features, and with the proviso that if the polybenzoxazole precursor polymer solely consists of polybenzoxazole precursor polymers that do not contain a photoactive moiety on the polymer, then (c) at least one photoactive compound is also present in the composition.
(FR)L'invention concerne une composition précurseur de PBO photosensible positive résistant à la chaleur qui comprend: (a) au moins un polymère précurseur de polybenzoxazole; (a) au moins un composé plastifiant; (b) au moins un solvant; la quantité de plastifiant présente dans la composition étant une quantité efficace pour réduire l'angle de paroi latérale des éléments imagés et durcis dans le film déposé sur le substrat afin d'empêcher l'apparition, en raison des angles aigus des éléments imagés, de défauts dus aux contraintes lors de métallisation ultérieure du substrat; et à condition que si le polymère précurseur de polybenzoxazole consiste uniquement en un polymère précurseur de polybenzoxazole ne contenant pas de fragment photoactif sur le polymère, alors (c) au moins un composé photoactif est également présent dans la composition.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)