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Machine translation
1. (WO2007021716) ABRASIVE-FREE POLISHING SYSTEM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/021716    International Application No.:    PCT/US2006/030982
Publication Date: 22.02.2007 International Filing Date: 09.08.2006
IPC:
C09G 1/04 (2006.01), H01L 21/321 (2006.01)
Applicants: CABOT MICROELECTRONICS CORPORATION [US/US]; Legal Department, 870 North Commons Drive, Aurora, Illinois 60504 (US)
Inventors: CHERIAN, Isaac; (US).
MOEGGENBORG, Kevin; (US)
Agent: WESEMAN, Steven; Associate General Counsel, Intellectual Property, Cabot Microelectronics Corporation, 870 North Commons Drive, Aurora, Illinois 60504 (US)
Priority Data:
11/205,428 17.08.2005 US
Title (EN) ABRASIVE-FREE POLISHING SYSTEM
(FR) SYSTEME DE POLISSAGE EXEMPT D'ABRASIF
Abstract: front page image
(EN)The invention provides a chemical-mechanical polishing system comprising a water-soluble silicate compound, an oxidizing agent that oxidizes at least a part of a substrate, water, and a polishing pad, wherein the polishing system is substantially free of abrasive particles. The invention further provides a method of chemically-mechanically polishing a substrate with the aforementioned polishing system. The polishing system is particularly useful in the removal of tantalum.
(FR)L'invention concerne un système de polissage chimique-mécanique comprenant un composé de silicate hydrosoluble, un agent oxydant oxydant au moins une partie d'un substrat, de l'eau et un tampon à polir, le système de polissage étant sensiblement exempt de particules abrasives. L'invention concerne également un procédé permettant de polir de manière chimique-mécanique un substrat au moyen dudit système de polissage. Celui-ci est spécialement utile pour l'élimination de tantale.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)