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Machine translation
1. (WO2007021023) ELECTROLESS PLATING APPARATUS AND PLATING LIQUID
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/021023    International Application No.:    PCT/JP2006/316287
Publication Date: 22.02.2007 International Filing Date: 15.08.2006
IPC:
C23C 18/31 (2006.01)
Applicants: EBARA CORPORATION [JP/JP]; 11-1, Haneda Asahi-cho, Ohta-ku, Tokyo 1448510 (JP) (For All Designated States Except US).
SAIJO, Yasuhiko [JP/JP]; (JP) (For US Only).
KOBA, Takashi [JP/JP]; (JP) (For US Only).
TSUJINO, Junichiro [JP/JP]; (JP) (For US Only)
Inventors: SAIJO, Yasuhiko; (JP).
KOBA, Takashi; (JP).
TSUJINO, Junichiro; (JP)
Agent: WATANABE, Isamu; GOWA Nishi-Shinjuku 4F 5-8, Nishi-Shinjuku 7-chome Shinjuku-ku, Tokyo 1600023 (JP)
Priority Data:
2005-237894 18.08.2005 JP
Title (EN) ELECTROLESS PLATING APPARATUS AND PLATING LIQUID
(FR) DISPOSITIF DE DEPOT AUTOCATALYTIQUE ET LIQUIDE DE DEPOT
(JA) 無電解めっき装置及びめっき液
Abstract: front page image
(EN)Disclosed is an electroless plating apparatus (16) which enables to form a plating film without deteriorating characteristics and reliability by suppressing degeneration of a plating liquid. This electroless plating apparatus (16) comprises a plating liquid circulation system (350) having a plating liquid supply pipe (308) for supplying a plating liquid in a plating liquid reservoir (302) to a plating bath (200), and a plating liquid recovery pipe (310) for returning the plating liquid in the plating bath (200) to the plating liquid reservoir (302), and heat retention units (272a, 272b, 352, 356) for suppressing decrease of the temperature of the plating liquid in the whole plating liquid circulation system (350).
(FR)Cette invention concerne un dispositif de dépôt autocatalytique (16) permettant de former un film de placage sans altérer des caractéristiques et la fiabilité par élimination de la dégénérescence d'un liquide de dépôt. Ce dispositif de dépôt autocatalytique (16) comprend un système de circulation de liquide de dépôt (350) doté d'un conduit d'alimentation (308) qui achemine un liquide de dépôt d'un réservoir (302) vers un bain galvanoplastique (200), un conduit de récupération (310) qui renvoie le liquide du bain (200) dans le réservoir (302), et des unités de rétention thermique (272a, 272b, 352, 356) qui éliminent la baisse de température du liquide dans l'ensemble du système de circulation de liquide de dépôt (350).
(JA)無電解めっき装置(16)は、めっき液の変質を抑制して、特性及び信頼性を損なうことのないめっき膜を形成することができる。この無電解めっき装置(16)は、めっき液貯槽(302)内のめっき液をめっき槽(200)に供給するめっき液供給管(308)とめっき槽(200)内のめっき液をめっき液貯槽(302)に戻すめっき液回収管(310)を有するめっき液循環系(350)と、めっき液循環系(350)全体におけるめっき液の液温の低下を抑制する保温部(272a,272b,352,356)とを有する。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)