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1. (WO2007021022) STRUCTURE AND MANUFACTURING METHOD OF THE SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/021022    International Application No.:    PCT/JP2006/316286
Publication Date: 22.02.2007 International Filing Date: 15.08.2006
IPC:
C03C 23/00 (2006.01), G02B 1/00 (2006.01)
Applicants: OHARA INC. [JP/JP]; 15-30, Oyama 1-chome, Sagamihara-shi, Kanagawa 229-1186 (JP) (For All Designated States Except US).
NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY [JP/JP]; 8, Kita 8-jyo Nishi 5-chome, kita-ku, Sapporo-shi, Hokkaido 060-0808 (JP) (For All Designated States Except US).
HASHIMOTO, Tomohiro [JP/JP]; (JP) (For US Only).
MISAWA, Hiroaki [JP/JP]; (JP) (For US Only)
Inventors: HASHIMOTO, Tomohiro; (JP).
MISAWA, Hiroaki; (JP)
Agent: SHIGA, Masatake; 2-3-1, Yaesu, Chuo-ku, Tokyo 104-8453 (JP)
Priority Data:
2005-235710 16.08.2005 JP
Title (EN) STRUCTURE AND MANUFACTURING METHOD OF THE SAME
(FR) STRUCTURE ET PROCEDE DE FABRICATION CORRESPONDANT
Abstract: front page image
(EN)An objective of the present invention is to provide a structure capable of obtaining a higher difference in refractive indices between that of a transparent material and that of a cavity, than in the past, and a manufacturing method thereof, and the present invention provides a structure having a transparent material and an internal cavity which is formed by irradiating said transparent material with a pulse laser beam having a pulse width of 10 x 10-12 seconds or less, and wherein refractive index of said transparent material at d line is nd → 1.3.
(FR)La présente invention concerne une structure permettant d'obtenir une différence supérieure entre les indices de réfraction d'un matériau transparent et d'une cavité qu'auparavant, et un procédé de fabrication correspondant. La structure comprend un matériau transparent et une cavité interne qui est formée par irradiation dudit matériau avec un faisceau laser pulsé ayant une longueur d'impulsion inférieure ou égale à 10 x 10-12 secondes, l'indice de réfraction dudit matériau au niveau de la ligne d étant nd ? 1,3.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)