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Pub. No.:    WO/2007/020963    International Application No.:    PCT/JP2006/316145
Publication Date: 22.02.2007 International Filing Date: 17.08.2006
B29C 33/38 (2006.01), B29C 59/04 (2006.01), B81C 99/00 (2010.01), B82B 1/00 (2006.01), B82B 3/00 (2006.01), H01L 21/027 (2006.01), H05K 3/10 (2006.01)
Applicants: NAMIKI SEIMITSU HOUSEKI KABUSHIKIKAISHA [JP/JP]; 8-22, Shinden 3-Chome Adachi-ku, Tokyo 1238511 (JP) (For All Designated States Except US).
NAKAMURA, Kazuya [JP/JP]; (JP) (For US Only).
IMAIZUMI, Nobuo [JP/JP]; (JP) (For US Only).
HIYAMA, Yoshihito [JP/JP]; (JP) (For US Only).
MAEDA, Ryutaro [JP/JP]; (JP) (For US Only).
GOTO, Hiroshi [JP/JP]; (JP) (For US Only)
Inventors: NAKAMURA, Kazuya; (JP).
IMAIZUMI, Nobuo; (JP).
HIYAMA, Yoshihito; (JP).
MAEDA, Ryutaro; (JP).
GOTO, Hiroshi; (JP)
NAMIKI SEIMITSU HOUSEKI KABUSHIKIKAISHA; 8-22, Shinden 3-Chome Adachi-ku, Tokyo 1238511 (JP)
Priority Data:
2005-236353 17.08.2005 JP
(JA) ナノインプリント方法及び装置
Abstract: front page image
(EN)Provided is a nanoimprint method for transferring a pattern by bringing a mold and an object into contact and by pressing them. The nanoimprint method comprises the step of preparing a transfer layer having a first fitting structure and a mold having a second fitting structure formed to fit the first fitting structure, the step of bringing the transfer layer and the mold into contact so that the first fitting structure and the second fitting structure may fit each other, and the step of applying, subsequent to the contacting step, a pressure to the contacting faces of the mold and the transfer layer thereby to transfer the pattern of the mold to the transfer layer.
(FR)La présente invention concerne un procédé de nanoimpression servant à transferer un motif en mettant en contact un moule et un objet et en les comprimant. Le procédé de nanoimpression comprend l'étape de préparation d'une couche de transfert comportant une première structure d’ajustement et un moule comportant une seconde structure d’ajustement dont la forme est adaptée à la première structure d’ajustement, l’étape de mise en contact de la couche de transfert et du moule de sorte que la première structure d’ajustement et la seconde structure d'ajustement s'adaptent l'une à l’autre, et l’étape d’application, à la suite de l'étape de mise en contact, d’une pression sur les faces en contact du moule et de la couche de transfert afin de transférer le motif du moule vers la couche de transfert.
(JA) 本発明の1つの側面によって提供されるナノインプリント方法は、モールドと被成形体 とを接触させて加圧することによりパターンの転写を行なうナノインプリント方法であっ て、第1の嵌合構造を有する転写層及び該第1の嵌合構造に嵌合するように形成された第 2の嵌合構造を有するモールドを準備するステップと、前記第1の嵌合構造と前記第2の 嵌合構造が嵌合するように前記転写層と前記モールドとを接触させるステップと、前記接 触ステップに続いて前記モールドと前記転写層の接触面に圧力を加えて前記転写層に前記 モールドのパターンを転写するステップとを備えることを特徴とする。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)