WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2007020067) IMMERSION LITHOGRAPHY OBJECTIVE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/020067    International Application No.:    PCT/EP2006/008073
Publication Date: 22.02.2007 International Filing Date: 16.08.2006
IPC:
G03F 7/20 (2006.01)
Applicants: CARL ZEISS SMT AG [DE/DE]; Rudolf-Eber-Strasse 2, 73447 Oberkochen (DE) (For All Designated States Except US).
ASML NETHERLANDS B.V. [NL/NL]; De Run 6501, NL-5504 DR Veldhoven (NL) (For All Designated States Except US).
GELLRICH, Bernhard [DE/DE]; (DE) (For US Only).
GRAEUPNER, Paul [DE/DE]; (DE) (For US Only).
FISCHER, Juergen [DE/DE]; (DE) (For US Only).
WURMBRAND, Andreas [DE/DE]; (DE) (For US Only).
JANSEN, Bauke [NL/NL]; (NL) (For US Only).
STREEFKERK, Bob [NL/NL]; (NL) (For US Only).
HOOGENDAM, Christiaan Alexander [NL/NL]; (NL) (For US Only).
BASELMANS, Johannes Jacobus Matheus [NL/NL]; (NL) (For US Only)
Inventors: GELLRICH, Bernhard; (DE).
GRAEUPNER, Paul; (DE).
FISCHER, Juergen; (DE).
WURMBRAND, Andreas; (DE).
JANSEN, Bauke; (NL).
STREEFKERK, Bob; (NL).
HOOGENDAM, Christiaan Alexander; (NL).
BASELMANS, Johannes Jacobus Matheus; (NL)
Agent: LORENZ & KOLLEGEN; Alte Ulmer Str. 2, 89522 Heidenheim (DE)
Priority Data:
60/708,810 16.08.2005 US
Title (EN) IMMERSION LITHOGRAPHY OBJECTIVE
(FR) OBJECTIF POUR LITHOGRAPHIE PAR IMMERSION
Abstract: front page image
(EN)An immersion lithography objective (2) has a housing in which at least one first optical element (4) is arranged, a second optical element (10), which follows the first optical element in the direction of the optical axis (13) of the objective, an immersion medium (12) that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure (11) for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.
(FR)Cette invention concerne un objectif pour lithographie par immersion (2) comportant un objectif dans lequel sont agencés au moins un premier élément optique (4), un second élément optique (10) suivant le premier élément optique dans le sens de l'axe optique (13) de l'objectif, un milieu d'immersion (12) adjacent au second élément optique, en aval de ce dernier dans la direction de l'axe optique, et une structure de retenue (11) pour le second élément optique. La structure de retenue présente une rigidité plus grande dans le sens de l'axe optique que dans le sens perpendiculaire à cet axe.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)