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1. (WO2007018376) PRODUCING METHOD FOR CERIUM-BASED GLASS POLISHING MATERIAL AND METHOD FOR USING THE SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/018376    International Application No.:    PCT/KR2006/003073
Publication Date: 15.02.2007 International Filing Date: 04.08.2006
IPC:
C09K 3/14 (2006.01)
Applicants: JOUNG, In [KR/KR]; (KR)
Inventors: JOUNG, In; (KR)
Agent: LEE, Jongwoo; 2nd Fl. Dukwon Bldg., 637-19, Yeoksam-dong, Kangnam-gu, Seoul 135-909 (KR)
Priority Data:
10-2005-0071585 05.08.2005 KR
Title (EN) PRODUCING METHOD FOR CERIUM-BASED GLASS POLISHING MATERIAL AND METHOD FOR USING THE SAME
(FR) PROCEDES DE PRODUCTION ET D'UTILISATION D'UN MATERIAU DE POLISSAGE DU VERRE A BASE DE CERIUM
Abstract: front page image
(EN)Disclosed herein is a method of using a cerium-based polishing composition to polish glass for a display. The cerium-based polishing composition is produced using a method, including the steps of calcining trivalent cerium salt, thereby converting the trivalent cerium salt into tetravalent cerium oxide having a particle size ranging from 10 to 100 nm; and mixing 1 to 90 weight % of the tetravalent cerium oxide with 9 to 98 weight % of water and 0.1 to 20 weight % of dispersant to form a mixture, and then pulverizing the mixture without drying, thereby producing a slurry type cerium-based polishing composition having a particle size ranging from 0.3 to 3 μm.
(FR)L'invention porte sur un procédé d'utilisation d'une composition à base de cérium de polissage du verre d'écrans. L'élaboration de la composition comporte les étapes suivantes: calcination d'un sel trivalent de cérium pour le convertir en oxyde tétravalent de cérium dont les particules ont une taille comprise entre 10 et 100 nm; mélange de 1 à 90 % en poids dudit oxyde à 9 à 98 % en poids d'eau et à 0,1 à 20 % en poids d'un dispersant, pour former un mélange; et pulvérisation sans séchage du mélange de manière à obtenir une pâte à polir dont les particules ont une taille allant de 0,3 à 3 µm.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)