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Pub. No.:    WO/2007/018137    International Application No.:    PCT/JP2006/315465
Publication Date: 15.02.2007 International Filing Date: 04.08.2006
C07D 471/04 (2006.01), A61K 31/437 (2006.01), A61P 9/10 (2006.01), A61P 9/14 (2006.01), A61P 15/00 (2006.01), A61P 17/06 (2006.01), A61P 19/02 (2006.01), A61P 27/02 (2006.01), A61P 29/00 (2006.01), A61P 35/00 (2006.01), A61P 35/02 (2006.01), A61P 43/00 (2006.01)
Applicants: CHUGAI SEIYAKU KABUSHIKI KAISHA [JP/JP]; 5-1, Ukima 5-chome, Kita-ku, Tokyo 1158543 (JP) (For All Designated States Except US).
THE UNIVERSITY OF TOKYO [JP/JP]; 3-1, Hongo 7-chome Bunkyo-ku, Tokyo 1138654 (JP) (For All Designated States Except US).
OZAWA, Sawako [JP/JP]; (JP) (For US Only).
OIKAWA, Nobuhiro [JP/JP]; (JP) (For US Only).
MIZUGUCHI, Eisaku [JP/JP]; (JP) (For US Only).
EBIIKE, Hirosato [JP/JP]; (JP) (For US Only).
WATANABE, Fumio [JP/JP]; (JP) (For US Only).
MORIKAMI, Kenji [JP/JP]; (JP) (For US Only).
SHIMMA, Nobuo [JP/JP]; (JP) (For US Only).
ISHII, Nobuya [JP/JP]; (JP) (For US Only).
TSUKAGUCHI, Toshiyuki [JP/JP]; (JP) (For US Only).
TAMAKI, Yasuhiro [JP/JP]; (JP) (For US Only).
TAKAHASHI, Hidenori [JP/JP]; (JP) (For US Only)
Inventors: OZAWA, Sawako; (JP).
OIKAWA, Nobuhiro; (JP).
MIZUGUCHI, Eisaku; (JP).
EBIIKE, Hirosato; (JP).
WATANABE, Fumio; (JP).
MORIKAMI, Kenji; (JP).
SHIMMA, Nobuo; (JP).
ISHII, Nobuya; (JP).
TSUKAGUCHI, Toshiyuki; (JP).
TAMAKI, Yasuhiro; (JP).
TAKAHASHI, Hidenori; (JP)
Agent: SHAMOTO, Ichio; YUASA AND HARA Section 206, New Ohtemachi Bldg. 2-1, Ohtemachi 2-chome Chiyoda-ku, Tokyo 100-0004 (JP)
Priority Data:
2005-228726 05.08.2005 JP
2005-347532 01.12.2005 JP
(JA) マルチキナーゼ阻害剤
Abstract: front page image
(EN)It is intended to provide a compound represented by the formula (1): [wherein Ar is an arylene group to be attached selected from the following formula (2): (wherein * represents a binding site to a nitrogen atom and ** represents a binding site to T); T represents -(O)n-R; R represents a C1 -C6 alkyl group or the like; n represents 0 or 1; X represents O or the like; R2, R3 and R4 are independently selected from a hydrogen atom or C1-C3 alkyl; or R2 and R3 may join together with an urea structure containing the nitrogen atoms to which they bind to form a 5- or 6-membered heterocycle; Y represents CH or N], or a pharmaceutically acceptable salt thereof or a prodrug thereof and a pharmaceutical composition containing the same.
(FR)La présente invention propose un composé représenté par la formule (1) : dans laquelle Ar est un groupe arylène destiné à être lié choisi dans la formule suivante (2) : dans laquelle * représente un site de liaison à un atome d'azote et ** représente un site de liaison à T ; T représente -(O)n-R ; R représente un groupe alkyle en C1 -C6 ou similaire ; n représente 0 ou 1; X représente O ou similaire ; R2, R3 et R4 sont indépendamment choisis parmi un atome d'hydrogène ou un alkyle en C1-C3 ; ou R2 et R3 peuvent se joindre conjointement avec une structure d'urée contenant les atomes d'azote auxquels ils se lient pour former un hétérocycle de 5 ou 6 chaînons ; Y représente CH or N, ou un sel pharmaceutiquement acceptable de celui-ci ou un promédicament de celui-ci et une composition pharmaceutique contenant celui-ci.
(JA)not available
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)