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Machine translation
1. (WO2007016592) GAS MANIFOLD VALVE CLUSTER
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/016592    International Application No.:    PCT/US2006/030000
Publication Date: 08.02.2007 International Filing Date: 31.07.2006
IPC:
C23C 16/00 (2006.01)
Applicants: AVIZA TECHNOLOGY, INC. [US/US]; 440 Kings Village Road, Scotts Valley, California 95066-4081 (US) (For All Designated States Except US).
BERCAW, Craig [US/US]; (US) (For US Only).
COSSENTINE, Dan [US/US]; (US) (For US Only).
YAO, Jack, Chihchieh [US/US]; (US) (For US Only).
LO, Tommy [US/US]; (US) (For US Only).
DEDONTNEY, Jay, Brian [US/US]; (US) (For US Only).
BARTHOLOMEW, Lawrence, D. [US/US]; (US) (For US Only).
CHATHAM III, Robert, Hood [US/US]; (US) (For US Only)
Inventors: BERCAW, Craig; (US).
COSSENTINE, Dan; (US).
YAO, Jack, Chihchieh; (US).
LO, Tommy; (US).
DEDONTNEY, Jay, Brian; (US).
BARTHOLOMEW, Lawrence, D.; (US).
CHATHAM III, Robert, Hood; (US)
Agent: SWIATEK, Maria, S.; Morgan, Lewis & Bockius LLP, 2 Palo Alto Square, 3000 El Camino Real, Palo Alto, CA 94306 (US)
Priority Data:
60/703,711 29.07.2005 US
60/703,717 29.07.2005 US
60/703,723 29.07.2005 US
Title (EN) GAS MANIFOLD VALVE CLUSTER
(FR) ENSEMBLE ROBINET D'INTERCOMMUNICATION DE GAZ
Abstract: front page image
(EN)The present invention relates generally to a deposition apparatus for semiconductor processing. More specifically, embodiments of the present invention relate to a gas manifold valve cluster and deposition apparatus. In some embodiments of the present invention a gas manifold valve cluster and system are provided that promotes reduced length and volumes of gas lines that will be exposed to atmosphere during cleaning which minimizes the time required to perform process chamber maintenance and therefore increase the productivity of the process chamber. In other embodiments a gas manifold valve cluster and ALD deposition apparatus are provided.
(FR)L'invention concerne de manière générale un appareil de dépôt pour le traitement de semi-conducteurs. De manière plus spécifique, des modes de réalisation de l'invention concernent un ensemble robinet d'intercommunication de gaz et un appareil de dépôt. Certains modes de réalisation de l'invention concernent un ensemble robinet d'intercommunication de gaz et un système permettant de favoriser la réduction de la longueur et de volumes de conduites de gaz exposées à l'atmosphère pendant leur nettoyage, ce qui permet de minimiser le temps nécessaire pour l'entretien de la chambre de traitement et d'augmenter la productivité de celle-ci. D'autres modes de réalisation de l'invention concernent un ensemble robinet d'intercommunication de gaz et un appareil de dépôt ALD.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)