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Machine translation
1. (WO2007016080) SILICON NANOPARTICLE FORMATION FROM SILICON POWDER AND HEXACHOLORPLATINIC ACID
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/016080    International Application No.:    PCT/US2006/028816
Publication Date: 08.02.2007 International Filing Date: 25.07.2006
IPC:
C01B 33/00 (2006.01), C01B 33/023 (2006.01)
Applicants: THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS [US/US]; 506 SOUTH WRIGHT STREET, 352 Henry Administration Building, Urbana, IL 61801 (US) (For All Designated States Except US).
NAYFEH, Munir, H. [US/US]; (US) (For US Only).
HOST, Jon [US/US]; (US) (For US Only).
NIELSEN, David [US/US]; (US) (For US Only)
Inventors: NAYFEH, Munir, H.; (US).
HOST, Jon; (US).
NIELSEN, David; (US)
Agent: FALLON, Steven, P.; GREER, BURNS & CRAIN, LTD., 300 S. Wacker Drive - Suite 2500, Chicago, IL 60606 (US)
Priority Data:
60/702,673 26.07.2005 US
Title (EN) SILICON NANOPARTICLE FORMATION FROM SILICON POWDER AND HEXACHOLORPLATINIC ACID
(FR) FORMATION DE NANOPARTICULES DE SILICIUM A PARTIR D'UNE POUDRE DE SILICIUM ET D'ACIDE HEXACHOLORPLATINIQUE
Abstract: front page image
(EN)A silicon nanoparticle formation method that can rapidly produce substantial quantities of silicon nanoparticles, which are readily recoverable for subsequent uses. Methods of the invention treat silicon powder in hexachloroplatinic acid. The treated silicon powder is then etched with an etching solution of HF/H2O2 to form Si nanoparticles
(FR)L'invention concerne un procédé de formation de nanoparticules de silicium, lequel permet de produire rapidement des quantités substantielles de nanoparticules de silicium, ces dernières étant facilement récupérables pour des utilisations subséquentes. Les procédés de cette invention consistent à traiter de la poudre de silicium dans de l'acide hexachloroplatinique. La poudre de silicium traitée est ensuite attaquée chimiquement avec une solution d'attaque chimique de HF/H2O2 pour former des nanoparticules de Si.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)