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1. (WO2007014294) SOLUTIONS INTEGRATED CIRCUIT INTEGRATION OF ALTERNATIVE ACTIVE AREA MATERIALS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/014294    International Application No.:    PCT/US2006/029247
Publication Date: 01.02.2007 International Filing Date: 26.07.2006
IPC:
H01L 21/8238 (2006.01), H01L 29/10 (2006.01), H01L 21/8234 (2006.01)
Applicants: AMBERWAVE SYSTEMS CORPORATION [US/US]; 13 Garabedian Drive, Salem, NH 03079 (US) (For All Designated States Except US).
LOCHTEFELD, Anthony, J. [US/US]; (US) (For US Only).
CURRIE, Matthew, T. [US/US]; (US) (For US Only).
CHIANG, Shi-Yuan [CN/US]; (US) (For US Only).
FIORENZA, James [US/US]; (US) (For US Only)
Inventors: LOCHTEFELD, Anthony, J.; (US).
CURRIE, Matthew, T.; (US).
CHIANG, Shi-Yuan; (US).
FIORENZA, James; (US)
Agent: US, Natasha, C.; GOODWIN PROCTER LLP, Exchange Place, Boston, MA 02109 (US)
Priority Data:
60/702,363 26.07.2005 US
Title (EN) SOLUTIONS INTEGRATED CIRCUIT INTEGRATION OF ALTERNATIVE ACTIVE AREA MATERIALS
(FR) SOLUTIONS PERMETTANT D'INTEGRER DES MATERIAUX ALTERNATIFS DANS DES CIRCUITS INTEGRES
Abstract: front page image
(EN)Methods of forming areas of alternative material on crystalline semiconductor substrates, and structures formed thereby. Such areas of alternative material are suitable for use as active areas in MOSFETs or other electronic or opto-electronic devices.
(FR)Procédé permettant de former des zones de matériaux alternatifs sur des substrats cristallins semi-conducteurs, et structures ainsi obtenues. De telles zones de matériaux alternatifs peuvent s'utiliser comme zones actives dans des transistors à effet de champ MOS ou dans d'autres dispositifs électroniques ou opto-électroniques.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)