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Machine translation
1. (WO2007013162) PHOTOMASK, METHOD FOR MANUFACTURING SUCH PHOTOMASK AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/013162    International Application No.:    PCT/JP2005/013877
Publication Date: 01.02.2007 International Filing Date: 28.07.2005
IPC:
G03F 1/29 (2012.01), G03F 1/32 (2012.01), G03F 1/36 (2012.01), G03F 1/68 (2012.01), H01L 21/027 (2006.01)
Applicants: FUJITSU LIMITED [JP/JP]; 1-1, Kamikodanaka 4-chome, Nakahara-ku, Kawasaki-s hi, Kanagawa 2118588 (JP) (For All Designated States Except US).
TAKEUCHI, Kanji [JP/JP]; (JP) (For US Only)
Inventors: TAKEUCHI, Kanji; (JP)
Agent: ITOH, Tadahiko; 32nd Floor Yebisu Garden Place Tower 20-3, Ebisu 4-chome Shibuya-ku, Tokyo 1506032 (JP)
Priority Data:
Title (EN) PHOTOMASK, METHOD FOR MANUFACTURING SUCH PHOTOMASK AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
(FR) PHOTOMASQUE, PROCÉDÉ DE FABRICATION D’UN TEL PHOTOMASQUE ET PROCÉDÉ DE FABRICATION D'UN DISPOSITIF ÉLECTRONIQUE
(JA) フォトマスクおよびその製造方法、電子装置の製造方法
Abstract: front page image
(EN)A photomask is composed of a transparent substrate; a light blocking film which is formed on the transparent substrate and forms an element pattern to be exposed on a wafer; and at least one pair of assist patterns which are formed of the light blocking film on the transparent substrate on the both sides of the element pattern, in sizes not to be resolved on the wafer. On a part of each of the pair of assist patterns, a step portion is provided.
(FR)Le photomasque selon l’invention est composé d’un substrat transparent ; d’une pellicule bloquant la lumière disposée sur le substrat transparent et servant de motif d'élément à exposer sur une galette ; et d’au moins une paire de motifs auxiliaires formés de la pellicule bloquant la lumière sur le substrat transparent des deux côtés du motif d'élément, de tailles n’étant pas développées sur la galette. Une partie de chaque motif auxiliaire comporte une portion de marche.
(JA) フォトマスクは、透明基板と、前記透明基板上に形成され、ウェハ上に露光される素子パターンを形成する遮光膜と、前記透明基板上に、前記遮光膜により、前記素子パターンの両側に、ウェハ上において解像されないような寸法でそれぞれ形成された、少なくとも1対のアシストパターンとよりなり、前記1対のアシストパターンの各々には、一部に段差部が設けられている。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)