WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2007010961) MODIFIED BASE MATERIAL AND METHOD FOR PRODUCING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/010961    International Application No.:    PCT/JP2006/314341
Publication Date: 25.01.2007 International Filing Date: 20.07.2006
IPC:
C08G 81/00 (2006.01), A61L 27/00 (2006.01), A61L 31/00 (2006.01), G01N 1/28 (2006.01)
Applicants: TORAY INDUSTRIES, INC. [JP/JP]; 1-1, Nihonbashi-Muromachi 2-chome, Chuo-ku, Tokyo 1038666 (JP) (For All Designated States Except US).
TAKAHASHI, Hiroshi [JP/JP]; (JP) (For US Only).
SUGAYA, Hiroyuki [JP/JP]; (JP) (For US Only)
Inventors: TAKAHASHI, Hiroshi; (JP).
SUGAYA, Hiroyuki; (JP)
Agent: IWAMI, Tomonori; c/o Intellectual Property Department TORAY INDUSTRIES, INC. 1-1, Sonoyama 1-chome Otsu-shi, Shiga 5208558 (JP)
Priority Data:
2005-209620 20.07.2005 JP
2005-271543 20.09.2005 JP
Title (EN) MODIFIED BASE MATERIAL AND METHOD FOR PRODUCING SAME
(FR) MATERIAU DE BASE MODIFIE ET SON PROCEDE DE FABRICATION
(JA) 改質基材とその製造方法
Abstract: front page image
(EN)Disclosed is a modified base material which is advantageous in the aspects of productivity and cost since adsorption of living-body components can be suppressed by using a smaller amount of a hydrophilic compound than the conventional base materials. In addition, this modified base material enables to reduce the amount of the hydrophilic compound dissolved therefrom. Specifically disclosed is a modified base material containing a substance which is composed of a polysiloxane and a polyether having a polypropylene glycol content of not less than 5 mol% and not more than 90 mol%, and preferably having a cloud point of not less than -10˚C and not more than 55˚C.
(FR)L'invention concerne un matériau de base modifié présentant des avantages au niveau de la productivité et des coûts, l'adsorption de composants de corps vivants pouvant être supprimée en utilisant une quantité réduite d'un composé hydrophile par rapport aux matériaux de base conventionnels. De plus, ce matériau de base modifié permet de réduire la quantité de composé hydrophile dissout. L'invention concerne plus précisément un matériau de base modifié contenant une substance composée d'un polysiloxane et d'un polyéther ayant une teneur en polypropylène glycol d'au moins 5 % en moles et d'au plus 90 % en moles, et ayant de préférence un point trouble d'au moins -10 °C et d'au plus 55 °C.
(JA) 従来より少量の親水性化合物で生体成分の吸着を抑制できるため、生産性、コストの面で有利であり、かつ親水性化合物の溶出低減が可能な改質基材を提供することにある。その解決手段として、ポリエーテル中におけるポリプロピレングリコールの含有率が5mol%以上90mol%以下、好ましくは、曇点が-10°C以上55°C以下であるポリエーテルとポリシロキサンからなる物質を含むことを特徴とする改質基材を提供する。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)