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1. (WO2007010874) METHOD FOR PRODUCING STRONTIUM BISMUTH TANTALATE FINE PARTICLE
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2007/010874 International Application No.: PCT/JP2006/314102
Publication Date: 25.01.2007 International Filing Date: 14.07.2006
IPC:
C01G 35/00 (2006.01) ,H01B 3/12 (2006.01)
C CHEMISTRY; METALLURGY
01
INORGANIC CHEMISTRY
G
COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F94
35
Compounds of tantalum
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
B
CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
3
Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
02
mainly consisting of inorganic substances
12
ceramics
Applicants:
旭硝子株式会社 ASAHI GLASS COMPANY, LIMITED [JP/JP]; 〒1008405 東京都千代田区有楽町一丁目12番1号 Tokyo 12-1, Yurakucho 1-chome, Chiyoda-ku, Tokyo 1008405, JP (AllExceptUS)
別府 義久 BEPPU, Yoshihisa [JP/JP]; JP (UsOnly)
砂原 一夫 SUNAHARA, Kazuo [JP/JP]; JP (UsOnly)
Inventors:
別府 義久 BEPPU, Yoshihisa; JP
砂原 一夫 SUNAHARA, Kazuo; JP
Agent:
泉名 謙治 SENMYO, Kenji; 〒1010042 東京都千代田区神田東松下町38番地 鳥本鋼業ビル Tokyo 4th Floor, SIA kanda Square 17, Kanda-konyacho Chiyoda-ku Tokyo 101-0035, JP
Priority Data:
2005-20649915.07.2005JP
Title (EN) METHOD FOR PRODUCING STRONTIUM BISMUTH TANTALATE FINE PARTICLE
(FR) PROCÉDÉ SERVANT À PRODUIRE DE FINES PARTICULES DE TANTALATE DE STRONTIUM ET DE BISMUTH
(JA) タンタル酸ストロンチウムビスマス微粒子の製造方法
Abstract:
(EN) Disclosed is a method for easily producing strontium bismuth tantalate fine particles exhibiting excellent uniformity in composition and particle size while having particularly high crystallinity. Specifically disclosed is a method for producing strontium bismuth tantalate fine particles which comprises, in the following order: a step for obtaining a molten material containing, in mol % in terms of oxides, 25-60% of SrO, 3-25% of Bi2O3, 3-25% of Ta2O5 and 15-60% of B2O3; a step for quickly cooling the molten material into an amorphous material; a step for precipitating a strontium bismuth tantalate crystal from the amorphous material; and a step for separating the strontium bismuth tantalate crystal from the thus-obtained crystallized precipitate.
(FR) L’invention concerne un procédé servant à produire facilement de fines particules de tantalate de strontium et de bismuth présentant une excellente uniformité en termes de composition et de taille des particules tout en ayant une cristallinité particulièrement élevée. L’invention concerne précisément un procédé servant à produire de fines particules de tantalate de strontium et de bismuth lequel comprend, dans l'ordre suivant : une étape consistant à obtenir une matière fondue contenant, en % molaire en termes d'oxydes, 25-60% de SrO, 3-25% de Bi2O3, 3-25% de Ta2O5 et 15-60% de B2O3 ; une étape consistant à refroidir rapidement la matière fondue en une matière amorphe ; une étape consistant à faire précipiter un cristal de tantalate de strontium et de bismuth dans la matière amorphe ; et une étape consistant à séparer le cristal de tantalate de strontium et de bismuth du précipité cristallisé ainsi obtenu.
(JA)  製造が容易で組成及び粒子径の均一性に優れ、特に高い結晶性を有するタンタル酸ストロンチウムビスマス微粒子の製造方法の提供。  酸化物基準のモル%表示で、SrOを25~60%、Biを3~25%、Taを3~25%、Bを15~60%含む溶融物を得る工程と、前記溶融物を急速冷却して非晶質物質とする工程と、前記非晶質物質からタンタル酸ストロンチウムビスマス結晶を析出させる工程と、得られた結晶化物から前記タンタル酸ストロンチウムビスマス結晶を分離する工程と、をこの順に含むことを特徴とするタンタル酸ストロンチウムビスマス微粒子の製造方法。
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Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
JPWO2007010874JP5056414