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1. (WO2007010866) BLANKS FOR GRAY TONE MASK, GRAY TONE MASK USING SAID BLANKS, AND PROCESS FOR PRODUCING SAID BLANKS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2007/010866 International Application No.: PCT/JP2006/314088
Publication Date: 25.01.2007 International Filing Date: 14.07.2006
IPC:
G02F 1/136 (2006.01)
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
136
Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
Applicants:
アルバック成膜株式会社 ULVAC COATING CORPORATION [JP/JP]; 〒3680056 埼玉県秩父市寺尾2804番地 Saitama 2804, Terao, Chichibu-shi, Saitama 3680056, JP (AllExceptUS)
山田 文彦 YAMADA, Fumihiko [JP/JP]; JP (UsOnly)
尾崎 俊治 OZAKI, Toshiharu [JP/JP]; JP (UsOnly)
佐々木 貴英 SASAKI, Takaei [JP/JP]; JP (UsOnly)
Inventors:
山田 文彦 YAMADA, Fumihiko; JP
尾崎 俊治 OZAKI, Toshiharu; JP
佐々木 貴英 SASAKI, Takaei; JP
Agent:
浜野 孝雄 HAMANO, Takao; 〒1050003 東京都港区西新橋1丁目1番15号 物産ビル別館 Tokyo Bussan Building Bekkan, 1-15, Nishi Shimbashi 1-chome, Minato-ku, Tokyo 1050003, JP
Priority Data:
2005-20729315.07.2005JP
Title (EN) BLANKS FOR GRAY TONE MASK, GRAY TONE MASK USING SAID BLANKS, AND PROCESS FOR PRODUCING SAID BLANKS
(FR) ÉBAUCHES POUR MASQUES À NUANCES DE GRIS, MASQUES À NUANCES DE GRIS UTILISANT LESDITES ÉBAUCHES ET PROCÉDÉ DE PRODUCTION DESDITES ÉBAUCHES
(JA) グレートーンマスク用ブランクス、及びそれを用いたグレートーンマスク及びその製造方法
Abstract:
(EN) This invention provides blanks for a gray tone mask, comprising a light shielding film and a semi-light-transparent film, adhered directly or indirectly onto a surface of a transparent substrate, wherein the light shielding film and the semi-light-transparent film are different from each other in the composition of the metal component, and the semi-light-transparent film is composed of Ni or composed of Ni as a main component and a metal component excluding Cr and Mo. There is also provided a process for producing a gray tone mask, comprising etching a light shielding film and a semi-light-transparent film by two-liquid etching with a Cr etching liquid (ceric nitrate + perchloric acid system) as a first etching liquid and an ITO etching liquid (HCl + FeCl3) or an FeCl3 solution as a second etching liquid in that order, forming an mask opening part, and then forming a semi-light-transparent part by half etching with a single etching liquid of a Cr etching liquid which can selectively wet-etch only the light shielding film.
(FR) La présente invention concerne des ébauches pour masques à nuances de gris qui comprennent un film pare-lumière et un film semi-transparent à la lumière, collés directement ou indirectement sur une surface d'un substrat transparent, le film pare-lumière et le film semi-transparent à la lumière étant différents l'un de l'autre en ce qui concerne la composition du composant métallique. Le film semi-transparent à la lumière est composé soit de Ni, soit de Ni en tant que composant principal et d'un composant métallique ne comprenant ni Cr, ni Mo. L'invention concerne également un procédé de production d'un masque à nuances de gris, comprenant l'attaque chimique d'un film pare-lumière et d'un film semi-transparent à la lumière par un système d'attaque à deux liquides comprenant un liquide d'attaque au Cr (système de nitrate cérique + acide perchlorique) en tant que premier liquide d'attaque et un liquide d'attaque ITO (HCl + FeCl3) ou une solution de FeCl3 en tant que second liquide d'attaque dans cet ordre, en formant une pièce d'ouverture de masque, puis en formant une pièce semi-transparente à la lumière par une demi-attaque avec un seul liquide d'attaque au Cr capable de n'attaquer sélectivement par attaque chimique humide que le film pare-lumière.
(JA)  本発明のグレートーンマスク用ブランクスは、透明基板の表面上に直接若しくは間接に付着させて形成した遮光膜及び半透光膜を有し、遮光膜及び半透光膜の金属成分の組成が異なっており、半透光膜がNi又はNiを主成分としてCr及びMoを除く金属成分を含んで構成される。  また、本発明のグレートーンマスクの製造方法は、第一のエッチング液としてCrエッチング液(硝酸第二セリウム+過塩素酸系)、そして、第二のエッチング液としてITOエッチング液(HCl+FeCl)又はFeCl溶液の順で二液エッチングにより遮光膜及び半透光膜をエッチングし、マスク開口部を形成し、次に、遮光膜のみを選択的にウエットエッチングできるCrエッチング液一液を用いて、ハーフエッチングを行い半透光部を形成することを含む。  
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Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020080018263JPWO2007010866CN101061430JP4898680