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1. (WO2007010794) PROCESS FOR PRODUCING RESIST COMPOSITION, FILTERING APPARATUS, RESIST COMPOSITION APPLICATOR, AND RESIST COMPOSITION
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2007/010794 International Application No.: PCT/JP2006/313852
Publication Date: 25.01.2007 International Filing Date: 12.07.2006
IPC:
G03F 7/26 (2006.01) ,B01D 61/14 (2006.01) ,B01D 61/58 (2006.01) ,B01D 71/26 (2006.01) ,B01D 71/32 (2006.01) ,B01D 71/56 (2006.01) ,G03F 7/039 (2006.01) ,G03F 7/16 (2006.01) ,H01L 21/027 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26
Processing photosensitive materials; Apparatus therefor
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
61
Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
14
Ultrafiltration; Microfiltration
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
61
Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
58
Multistep processes
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
71
Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
06
Organic material
26
Polyalkenes
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
71
Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
06
Organic material
30
Polyalkenyl halides
32
containing fluorine atoms
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
71
Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
06
Organic material
56
Polyamides, e.g. polyester-amides
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
039
Macromolecular compounds which are photodegradable, e.g. positive electron resists
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
16
Coating processes; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
Applicants:
東京応化工業株式会社 TOKYO OHKA KOGYO CO., LTD. [JP/JP]; 〒2110012 神奈川県川崎市中原区中丸子150番地 Kanagawa 150, Nakamaruko, Nakahara-ku, Kawasaki-shi, Kanagawa 2110012, JP (AllExceptUS)
室井 雅昭 MUROI, Masaaki [JP/JP]; JP (UsOnly)
尾崎 弘和 OZAKI, Hirokazu [JP/JP]; JP (UsOnly)
Inventors:
室井 雅昭 MUROI, Masaaki; JP
尾崎 弘和 OZAKI, Hirokazu; JP
Agent:
棚井 澄雄 TANAI, Sumio; 〒1048453 東京都中央区八重洲2丁目3番1号 Tokyo 2-3-1, Yaesu Chuo-ku, Tokyo 104-8453, JP
Priority Data:
2005-20854319.07.2005JP
Title (EN) PROCESS FOR PRODUCING RESIST COMPOSITION, FILTERING APPARATUS, RESIST COMPOSITION APPLICATOR, AND RESIST COMPOSITION
(FR) PROCÉDÉ DE PRODUCTION DE COMPOSITIONS DE RÉSIST, APPAREIL DE FILTRATION, APPLICATEUR DE COMPOSITION DE RÉSIST, ET COMPOSITION DE RÉSIST
(JA) レジスト組成物の製造方法、ろ過装置、レジスト組成物の塗布装置およびレジスト組成物
Abstract:
(EN) A process for producing a resist composition in which a resist composition having the occurrence of defects therein suppressed can be obtained; a filtering apparatus suitable for use in the process; a resist composition applicator having the filtering apparatus mounted thereon; and a resist composition having the occurrence of defects therein suppressed. This resist composition is obtained by first providing a resist composition having, dissolved in an organic solvent, a resist component whose solubility in alkali is varied by the action of an acid and an acid generator component capable of generating an acid when exposed to light and thereafter passing the resist composition through a filter equipped with a polyethylene hollow yarn membrane.
(FR) La présente invention concerne un procédé de production d’une composition de résist permettant de supprimer l’apparition de défauts dans la composition de résist ; un appareil de filtration pouvant être utilisé lors du procédé ; un applicateur de composition de résist sur lequel est monté un appareil de filtration ; et une composition de résist dans laquelle toute apparition de défauts a été supprimée. Cette composition de résist est obtenue en se servant d’abord d’une composition de résist comprenant un composant de résist, dissout dans un solvant organique, dont la solubilité dans les alcalis varie sous l’action d’un acide et un composant générateur d’acide capable de générer un acide lorsqu’il est exposé à la lumière, puis en passant la composition de résist dans un filtre équipé d’une membrane de polyéthylène à fils creux.
(JA)  ディフェクトの発生が抑制されたレジスト組成物が得られるレジスト組成物の製造方法、前記製造方法に好適に使用できるろ過装置、前記ろ過装置を搭載したレジスト組成物の塗布装置、およびディフェクトの発生が抑制されたレジスト組成物が提供される。この組成物は、酸の作用によりアルカリ可溶性が変化する樹脂成分と、露光により酸を発生する酸発生剤成分を有機溶剤に溶解してなるレジスト組成物を、ポリエチレン製の中空糸膜を備えたフィルタを通過させることによって得られる。
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Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020080022226JP2007025341US20090286178CN101223482