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1. (WO2007010766) LAYERED SHEETS AND PROCESSES FOR PRODUCING THE SAME
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2007/010766 International Application No.: PCT/JP2006/313597
Publication Date: 25.01.2007 International Filing Date: 07.07.2006
IPC:
B29C 39/12 (2006.01) ,B24B 37/04 (2006.01) ,B29C 67/20 (2006.01) ,B32B 5/20 (2006.01) ,C08G 18/40 (2006.01) ,C08J 9/30 (2006.01) ,H01L 21/304 (2006.01) ,H01L 21/683 (2006.01) ,B29K 75/00 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
C
SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
39
Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
02
for making articles of definite length, i.e. discrete articles
12
Making multilayered or multicoloured articles
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
37
Lapping machines or devices; Accessories
04
designed for working plane surfaces
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
C
SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
67
Shaping techniques not covered by groups B29C39/-B29C65/93
20
for porous or cellular articles, e.g. of foam plastics, coarse-pored
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
5
Layered products characterised by the non-homogeneity or physical structure of a layer
18
characterised by features of a layer containing foamed or specifically porous material
20
foamed in situ
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
18
Polymeric products of isocyanates or isothiocyanates
06
with compounds having active hydrogen
28
characterised by the compounds used containing active hydrogen
40
High-molecular-weight compounds
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
J
WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
9
Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
30
by mixing gases into liquid compositions or plastisols, e.g. frothing with air
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
04
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30
Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
302
to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
304
Mechanical treatment, e.g. grinding, polishing, cutting
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683
for supporting or gripping
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
K
INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D103
75
Use of polyureas or polyurethanes as moulding material
Applicants:
東洋ゴム工業株式会社 TOYO TIRE & RUBBER CO., LTD. [JP/JP]; 〒5508661 大阪府大阪市西区江戸堀1丁目17番18号 Osaka 17-18, Edobori 1-chome, Nishi-ku, Osaka-shi, Osaka 5508661, JP (AllExceptUS)
廣瀬 純司 HIROSE, Junji [JP/JP]; JP (UsOnly)
福田 武司 FUKUDA, Takeshi [JP/JP]; JP (UsOnly)
Inventors:
廣瀬 純司 HIROSE, Junji; JP
福田 武司 FUKUDA, Takeshi; JP
Agent:
鈴木 崇生 SUZUKI, Takao; 〒5320011 大阪府大阪市淀川区西中島5丁目13-9 新大阪MTビル1号館 Osaka Shin-Osaka MT Bldg. 1 13-9, Nishinakajima 5-chome Yodogawa-ku, Osaka-shi Osaka 532-0011, JP
Priority Data:
2005-20695015.07.2005JP
2006-07287316.03.2006JP
2006-07290716.03.2006JP
2006-07294516.03.2006JP
2006-07295716.03.2006JP
Title (EN) LAYERED SHEETS AND PROCESSES FOR PRODUCING THE SAME
(FR) FEUILLES STRATIFIÉES ET PROCÉDÉS DE PRODUCTION CORRESPONDANTS
(JA) 積層シート及びその製造方法
Abstract:
(EN) A process for extremely easily producing a layered sheet which has a holding surface having high surface precision; a process for extremely easily producing a layered sheet which has a holding surface having high surface precision and which has the excellent property of adsorptively holding a material to be ground; a layered sheet which has a holding surface having surface precision and has the excellent property of adsorptively holding a material to be ground and a process for producing the layered sheet; and a layered sheet which has the excellent property of adsorptively holding a material to be ground and has excellent durability. The layered sheets each comprises a base sheet and a polyurethane foam layer.
(FR) La présente invention concerne un procédé permettant de produire très facilement une feuille stratifiée dotée d’une surface d’appui présentant une précision de surface élevée ; un procédé permettant de produire très facilement une feuille stratifiée qui est dotée d’une surface d’appui présentant une précision de surface élevée et qui possède d’excellentes propriétés de soutien par adsorption d’un matériau à meuler ; une feuille stratifiée comprenant une surface d’appui présentant une surface de précision élevée et qui possède d’excellentes propriétés de soutien par adsorption d’un matériau à meuler et un procédé permettant de produire la feuille stratifiée ; et une feuille stratifiée possédant d’excellentes propriétés de soutien par adsorption d’un matériau à meuler ainsi que d’excellentes caractéristiques de durabilité. Chaque feuille stratifiée comprend une feuille de base et une couche de mousse en polyuréthane.
(JA)  第1発明は、保持面の表面精度が高い積層シートを極めて容易に製造する方法を提供することを目的とする。第2発明は、保持面の表面精度が高く、被研磨材の吸着性に優れる積層シートを極めて容易に製造する方法を提供することを目的とする。第3発明は、保持面の表面精度が高く、被研磨材の吸着性に優れる積層シート及びその製造方法を提供することを目的とする。第4発明は、被研磨材の吸着性に優れ、かつ耐久性に優れる積層シートを提供することを目的とする。本発明の積層シートは、基材シートとポリウレタン発泡層を含む。
front page image
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020080030092US20090148687CN101223016