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1. (WO2007010702) IN SM OXIDE SPUTTERING TARGET
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2007/010702 International Application No.: PCT/JP2006/312412
Publication Date: 25.01.2007 International Filing Date: 21.06.2006
IPC:
C23C 14/34 (2006.01) ,C04B 35/00 (2006.01) ,C04B 35/50 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
C CHEMISTRY; METALLURGY
04
CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
B
LIME; MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
35
Shaped ceramic products characterised by their composition; Ceramic compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
C CHEMISTRY; METALLURGY
04
CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
B
LIME; MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
35
Shaped ceramic products characterised by their composition; Ceramic compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
50
based on rare earth compounds
Applicants:
出光興産株式会社 IDEMITSU KOSAN CO., LTD. [JP/JP]; 〒1008321 東京都千代田区丸の内三丁目1番1号 Tokyo 1-1, Marunouchi 3-chome, Chiyoda-ku, Tokyo 1008321, JP (AllExceptUS)
井上 一吉 INOUE, Kazuyoshi [JP/JP]; JP (UsOnly)
田中 信夫 TANAKA, Nobuo [JP/JP]; JP (UsOnly)
笘井 重和 TOMAI, Shigekazu [JP/JP]; JP (UsOnly)
松原 雅人 MATSUBARA, Masato [JP/JP]; JP (UsOnly)
海上 暁 KAIJO, Akira [JP/JP]; JP (UsOnly)
矢野 公規 YANO, Koki [JP/JP]; JP (UsOnly)
Inventors:
井上 一吉 INOUE, Kazuyoshi; JP
田中 信夫 TANAKA, Nobuo; JP
笘井 重和 TOMAI, Shigekazu; JP
松原 雅人 MATSUBARA, Masato; JP
海上 暁 KAIJO, Akira; JP
矢野 公規 YANO, Koki; JP
Agent:
渡辺 喜平 WATANABE, Kihei; 〒1010041 東京都千代田区神田須田町一丁目26番 芝信神田ビル3階 Tokyo Shibashin Kanda Bldg. 3rd Floor 26, Kanda Suda-cho 1-chome Chiyoda-ku, Tokyo 1010041, JP
Priority Data:
2005-20751315.07.2005JP
2005-25874007.09.2005JP
Title (EN) IN SM OXIDE SPUTTERING TARGET
(FR) CIBLE CONTENANT DE L'OXYDE IN SM POUR LA PULVERISATION SOUS VIDE
(JA) In・Sm酸化物系スパッタリングターゲット
Abstract:
(EN) A sputtering target characterized by consisting of a sintered body of oxide containing In and Sm as main components. Further, there is provided a sputtering target characterized by consisting of a sintered body of oxide containing In and Sm as main components doped with at least one element with an atomic valency of positive tetravalency or higher in an amount of 20 at.% or less based on the sum of all cation elements.
(FR) L'invention concerne une cible de pulvérisation sous vide, caractérisée en ce qu'elle consiste en un corps d'oxyde fritté contenant principalement de l'In et du Sm. L'invention concerne en outre une cible de pulvérisation sous vide, caractérisée en ce qu'elle consiste en un corps d'oxyde fritté contenant de l'In et du Sm en tant que composants principaux, dopé par au moins un élément ayant une valence atomique positive de quatre ou plus à hauteur d'au plus 20 % atomiques par rapport à l'ensemble des éléments cationiques.
(JA)  InとSmを主成分とする酸化物の焼結体からなることを特徴とするスパッタリングターゲット。及び、InとSmを主成分とする酸化物の焼結体に正四価以上の原子価を有する元素の少なくとも1種が、全カチオン元素の合計量に対して20原子%以下でドープされていることを特徴とするスパッタリングターゲット。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020080026169EP1905864US20090121199CN101223296JP5089386