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1. (WO2007009543) PELLICLE FOR USE IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2007/009543 International Application No.: PCT/EP2006/005833
Publication Date: 25.01.2007 International Filing Date: 19.06.2006
IPC:
G03F 1/14 (2006.01) ,G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
14
Originals characterised by structural details, e.g. supports, cover layers, pellicle rings
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
CARL ZEISS SMT AG [DE/DE]; Rudolf-Eber-Strasse 2 D-73447 Oberkochen, DE (AllExceptUS)
GÖHNERMEIER, Aksel [DE/DE]; DE (UsOnly)
PAZIDIS, Alexandra [DE/DE]; DE (UsOnly)
Inventors:
GÖHNERMEIER, Aksel; DE
PAZIDIS, Alexandra; DE
Agent:
SCHWANHÄUSSER, Gernot ; Ostertag & Partner Epplestr. 14 70597 Stuttgart, DE
Priority Data:
60/700,14218.07.2005US
Title (EN) PELLICLE FOR USE IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS
(FR) PELLICULE DESTINEE A ETRE UTILISEE DANS UN APPAREIL D'EXPOSITION DE PROJECTION MICROLITHOGRAPHIQUE
Abstract:
(EN) A pellicle for use in a microlithographic exposure apparatus (10) has, for an operating wavelength of the apparatus, a maximum transmittance for light rays (56) that obliquely impinge on the pellicle (34; 134; 234) . This ensures smaller variations of the transmittance over a broad range of angles of incidence, as it occurs in very high numerical aperture projection lenses.
(FR) La présente invention a trait à une pellicule destinée à être utilisée dans un appareil d'exposition de projection microlithographique (10) présentant, pour une longueur d'onde de fonctionnement de l'appareil, un facteur de transmission maximal pour des rayons lumineux (56) qui assurent un impact oblique sur la pellicule (34; 134; 234). Cela permet des plus petites variations du facteur de transmission sur une large plage d'angles d'incidence, étant qu'il se produit dans des lentilles de projection à ouverture numérique.
front page image
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
KR1020080023338EP1904894US20090059189