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1. (WO2007008727) SYSTEM AND METHOD FOR HIGH POWER LASER PROCESSING
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/008727    International Application No.:    PCT/US2006/026626
Publication Date: 18.01.2007 International Filing Date: 07.07.2006
IPC:
H01S 3/13 (2006.01), G02B 6/00 (2006.01)
Applicants: GSI GROUP CORPORATION [US/US]; 39 Manning Road, Billerica, MA 01821 (US) (For All Designated States Except US).
BROWN, David [US/US]; (US) (For US Only)
Inventors: BROWN, David; (US)
Agent: HILTON, William, E.; Gauthier & Connors, LLP, 225 Franklin Street, Suite 2300, Boston, MA 02110 (US)
Priority Data:
60/698,592 12.07.2005 US
60/779,780 07.03.2006 US
Title (EN) SYSTEM AND METHOD FOR HIGH POWER LASER PROCESSING
(FR) SYSTEME ET PROCEDE DE TRAITEMENT D'UN LASER DE FORTE PUISSANCE
Abstract: front page image
(EN)A high power laser processing system is disclosed that includes a laser source and at least one optical element. The laser source provides a high power laser illumination of a first wavelength. The optical element includes a substrate that is substantially transparent to the first wavelength illumination, at least one highly reflective coating on a first side of the substrate, and at least one anti-reflective coating on a second side of the substrate.
(FR)L'invention porte sur un système de traitement d'un laser de forte puissance comprenant une source laser et au moins un élément optique. La source laser fournit un éclairage de forte puissance d'une première longueur d'onde. L'élément optique comprend: un substrat sensiblement transparent pour l'éclairage de cette première longueur d'onde; au moins un revêtement fortement réflecteur disposé d'un premier côté du substrat; et au moins un revêtement anti-réfléchissant disposé de l'autre côté du substrat.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)