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1. (WO2007008374) METHOD AND SYSTEM FOR NON-DESTRUCTIVE DISTRIBUTION PROFILING OF AN ELEMENT IN A FILM
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2007/008374 International Application No.: PCT/US2006/024581
Publication Date: 18.01.2007 International Filing Date: 23.06.2006
IPC:
G01J 3/45 (2006.01)
G PHYSICS
01
MEASURING; TESTING
J
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
3
Spectrometry; Spectrophotometry; Monochromators; Measuring colours
28
Investigating the spectrum
45
Interferometric spectrometry
Applicants:
REVERA INCORPORATED [US/US]; 810 Kifer Road Sunnyvale, CA 94086, US (AllExceptUS)
DECECCO, Paola [US/US]; US (UsOnly)
SCHUELER, Bruno [US/US]; US (UsOnly)
REED, David [US/US]; US (UsOnly)
KWAN, Michael [US/US]; US (UsOnly)
BALLANCE, David, S. [US/US]; US (UsOnly)
Inventors:
DECECCO, Paola; US
SCHUELER, Bruno; US
REED, David; US
KWAN, Michael; US
BALLANCE, David, S.; US
Agent:
BERNADICOU, Michael, A. ; Blakely, Sokoloff, Taylor & Zafman LLP 12400 Wilshire Boulevard, 7th Floor Los Angeles, CA 90025, US
Priority Data:
11/218,11431.08.2005US
60/698,36711.07.2005US
Title (EN) METHOD AND SYSTEM FOR NON-DESTRUCTIVE DISTRIBUTION PROFILING OF AN ELEMENT IN A FILM
(FR) PROCEDE NON DESTRUCTIF ET SYSTEME POUR L'ETABLISSEMENT D'UN PROFIL DE DISTRIBUTION D'UN ELEMENT DANS UN FILM
Abstract:
(EN) A method to determine a distribution profile of an element in a film. The method comprises exciting an electron energy of an element deposited in a first film, obtaining a first spectrum associating with the electron energy, and removing a background spectrum from the first spectrum. Removing the background value generates a processed spectrum. The method further includes matching the processed spectrum to a simulated spectrum with a known simulated distribution profile for the element in a film comparable to the first film. A distribution profile is obtained for the element in the first film based on the matching of the processed spectrum to a simulated spectrum selected from the set of simulated spectra.
(FR) L'invention concerne un procédé destiné à déterminer un profil de distribution d'un élément dans un film. Ce procédé consiste à exciter une énergie d'électrons d'un élément déposé dans un premier film, à obtenir un premier spectre associé à l'énergie d'électrons, et à supprimer un spectre de fond à partir du premier spectre. La suppression de la valeur de fond permet de générer un spectre traité. Le procédé consiste en outre à confronter le spectre traité avec un spectre simulé présentant un profil de distribution simulé connu pour l'élément dans un film comparable au premier film. Un profil de distribution est obtenu pour l'élément dans le premier film sur la base de la confrontation du spectre traité avec un spectre simulé choisi dans un ensemble de spectres simulés.
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Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
KR1020080050567EP1907936JP2009500642CN101523171