Search International and National Patent Collections
Some content of this application is unavailable at the moment.
If this situation persists, please contact us atFeedback&Contact
1. (WO2007008251) HARD MASK STRUCTURE FOR PATTERNING OF MATERIALS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2007/008251 International Application No.: PCT/US2005/044263
Publication Date: 18.01.2007 International Filing Date: 07.12.2005
Chapter 2 Demand Filed: 02.10.2006
IPC:
H01L 21/00 (2006.01) ,B44C 1/22 (2006.01) ,B05C 1/00 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
B PERFORMING OPERATIONS; TRANSPORTING
44
DECORATIVE ARTS
C
PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
1
Processes, not specifically provided for elsewhere, for producing decorative surface effects
22
Removing surface-material, e.g. by engraving, by etching
B PERFORMING OPERATIONS; TRANSPORTING
05
SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
C
APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
1
Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
Applicants:
INTERNATIONAL BUSINESS MACHINES CORPORATION [US/US]; New Orchard Road Armonk, NY 10504, US (AllExceptUS)
GAIDIS, Michael, C. [US/US]; US (UsOnly)
KANAKASABAPATHY, Sivananda, K. [IN/US]; US (UsOnly)
O'SULLIVAN, Eugene, J. [IE/US]; US (UsOnly)
Inventors:
GAIDIS, Michael, C.; US
KANAKASABAPATHY, Sivananda, K.; US
O'SULLIVAN, Eugene, J.; US
Agent:
ELLENBOGEN, Wayne, L.; Ryan, Mason & Lewis, LLP 90 Forest Avenue Locust Valley, NY 11560, US
Priority Data:
11/177,00808.07.2005US
Title (EN) HARD MASK STRUCTURE FOR PATTERNING OF MATERIALS
(FR) STRUCTURE DE MASQUE DUR PERMETTANT DE FORMER DE MOTIFS SUR DES MATERIAUX
Abstract:
(EN) Techniques for magnetic device (302) fabrication are provided. In one aspect, a method of patterning at least one, e.g., nonvolatile, material comprises the following steps. A hard mask structure (315), comprising thin hard mask layer (316) and thick hard mask layer (318) is formed on at least one surface of the material to be patterned. The hard mask structure is configured to have a base, proximate to the material, and a top opposite the base. The base has one~ or more lateral dimensions that are greater than one or more lateral dimensions of the top of the hard mask structure, such that at least one portion of the base extends out laterally a substantial distance beyond the top. The top of the hard mask structure is at a greater vertical distance from the material being etched than the base. The material is etched.
(FR) L'invention se rapporte à des techniques de fabrication de dispositif magnétique. Dans un aspect, un procédé de formation de motifs sur au moins un matériau non volatile par exemple, consiste à former une structure de masque dur sur au moins une surface du matériau à graver. La structure de masque dur est configurée pour avoir une base située à proximité du matériau et un sommet opposé à la base. La base a au moins une dimension latérale plus importante qu'au moins une dimension latérale du sommet de la structure de masque dur, de sorte qu'au moins une partie de la base s'étende latéralement à l'extérieur par rapport à une distance latérale sensible en dehors du sommet. Le sommet de la structure de masque dur est situé à une distance verticale plus importante du matériau gravé que la base. On grave le matériau.
front page image
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
EP1908094JP2009500846CN101300661CA2614373