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1. (WO2007008088) NANOSCALE AND MICROSCALE LITHOGRAPHY METHODS AND RESULTANT DEVICES
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2007/008088 International Application No.: PCT/NZ2006/000173
Publication Date: 18.01.2007 International Filing Date: 04.07.2006
Chapter 2 Demand Filed: 03.05.2007
IPC:
G03F 7/40 (2006.01) ,B82B 3/00 (2006.01) ,B82B 1/00 (2006.01) ,C23C 14/04 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26
Processing photosensitive materials; Apparatus therefor
40
Treatment after imagewise removal, e.g. baking
B PERFORMING OPERATIONS; TRANSPORTING
82
NANO-TECHNOLOGY
B
NANO-STRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
3
Manufacture or treatment of nano-structures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
B PERFORMING OPERATIONS; TRANSPORTING
82
NANO-TECHNOLOGY
B
NANO-STRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
1
Nano-structures formed by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
04
Coating on selected surface areas, e.g. using masks
Applicants:
NANO CLUSTER DEVICES LTD [NZ/NZ]; 6th Floor Rutherford Building University of Canterbury Christchurch, 8041, NZ (AllExceptUS)
BROWN, Simon Anthony [NZ/NZ]; NZ (UsOnly)
REICHEL, Rene [DE/NZ]; NZ (UsOnly)
PARTRIDGE, James, Gordon [GB/NZ]; NZ (UsOnly)
AWASTHI, Aruna [IN/NZ]; NZ (UsOnly)
HENDY, Shaun Cameron [NZ/NZ]; NZ (UsOnly)
ZOONTJENS, Peter, Anthony [NZ/NZ]; NZ (UsOnly)
Inventors:
BROWN, Simon Anthony; NZ
REICHEL, Rene; NZ
PARTRIDGE, James, Gordon; NZ
AWASTHI, Aruna; NZ
HENDY, Shaun Cameron; NZ
ZOONTJENS, Peter, Anthony; NZ
Agent:
ADAMS, Matthew, D ; A J Park 6th Floor Huddart Parker Building PO Box 949 Wellington, 6015, NZ
Priority Data:
54120908.07.2005NZ
54778407.06.2006NZ
Title (EN) NANOSCALE AND MICROSCALE LITHOGRAPHY METHODS AND RESULTANT DEVICES
(FR) PROCEDES DE LITHOGRAPHIE A NANO-ECHELLE/MICRO-ECHELLE ET DISPOSITIFS RESULTANTS
Abstract:
(EN) The invention relates to a method of preparing a pattern of micron sized, and smaller particles on a substrate surface. The pattern can take the form of a conducting pathway of atomic clusters between contacts. The method of the invention can be an alternative to conventional lithographic patterning techniques which does not require a lift-off step.
(FR) Procédé d'élaboration de motif de particules de la taille du micron et de taille inférieure sur une surface de substrat. Le motif peut prendre la forme d'un trajet conducteur d'agrégats atomiques entre contacts. Le procédé décrit peut se substituer aux techniques d'élaboration de motif lithographique classiques, sans recours à une phase de soulèvement.
front page image
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)