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1. (WO2007007800) BLACK PASTE COMPOSITION, METHOD FOR BLACK MATRIX PATTERN FORMATION USING THE SAME, AND ITS BLACK MATRIX PATTERN
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2007/007800 International Application No.: PCT/JP2006/313890
Publication Date: 18.01.2007 International Filing Date: 12.07.2006
IPC:
G03F 7/031 (2006.01) ,G03F 7/004 (2006.01) ,G03F 7/032 (2006.01) ,C08F 2/50 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
028
with photosensitivity-increasing substances, e.g. photoinitiators
031
Organic compounds not covered by group G03F7/02967
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032
with binders
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2
Processes of polymerisation
46
Polymerisation initiated by wave energy or particle radiation
48
by ultra-violet or visible light
50
with sensitising agents
Applicants:
太陽インキ製造株式会社 TAIYO INK MFG. CO., LTD. [JP/JP]; 〒1768508 東京都練馬区羽沢2丁目7番1号 Tokyo 2-7-1, Hazawa, Nerima-ku, Tokyo 1768508, JP (AllExceptUS)
佐々木 正樹 SASAKI, Masaki [JP/JP]; null (UsOnly)
加藤 賢治 KATO, Kenji [JP/JP]; null (UsOnly)
有馬 聖夫 ARIMA, Masao [JP/JP]; null (UsOnly)
Inventors:
佐々木 正樹 SASAKI, Masaki; null
加藤 賢治 KATO, Kenji; null
有馬 聖夫 ARIMA, Masao; null
Agent:
鈴江 武彦 SUZUYE, Takehiko; 〒1050001 東京都港区虎ノ門1丁目12番9号 鈴榮特許綜合事務所内 Tokyo c/o SUZUYE & SUZUYE 1-12-9, Toranomon Minato-ku, Tokyo 1050001, JP
Priority Data:
2005-20408913.07.2005JP
Title (EN) BLACK PASTE COMPOSITION, METHOD FOR BLACK MATRIX PATTERN FORMATION USING THE SAME, AND ITS BLACK MATRIX PATTERN
(FR) COMPOSITION DE PÂTE NOIRE, PROCÉDÉ DE TRAÇAGE D’UN MOTIF DE MATRICE NOIRE L'UTILISANT, ET SON MOTIF DE MATRICE NOIRE
(JA) 黒色ペースト組成物、及びそれを用いたブラックマトリックスパターンの形成方法、並びにそのブラックマトリックスパターン
Abstract:
(EN) This invention provides an alkali development-type black paste composition, which is suitable for a laser direct imaging apparatus using a laser oscillation source having a maximum wavelength of 350 nm to 420 nm, is useful for the formation of a high-definition black matrix pattern with high efficiency and has excellent storage stability, a black matrix pattern comprising the composition, and a plasma display panel having the black matrix pattern, and a method for the formation of the black matrix pattern. The alkali development-type black paste composition comprises (A)a carboxyl-containing resin, (B) a glass frit, (C)a black pigment, (D) a compound having one or more radically polymerizable unsaturated group in one molecule, and (E-1) an oxime-type photopolymerization initiator represented by general formula (I).
(FR) La présente invention concerne une composition de pâte noire de type développement alcalin, laquelle est appropriée à l'utilisation dans un appareil d'imagerie par laser directe au moyen d’une source d’oscillation laser de longueur d’onde maximale comprise entre 350 nm et 420 nm, permet de tracer un motif de matrice noire haute définition avec une efficacité élevée et présente une excellente capacité d’entreposage, un motif de matrice noire comprenant la composition, et un panneau d’affichage à plasma comportant le motif de matrice noire, et un procédé de traçage du motif de matrice noire. La composition de pâte noire de type développement alcalin comprend (A) une résine contenant un carboxyle, (B) une fritte de verre, (C) un pigment noir, (D) un composé comportant un ou plusieurs groupes insaturés polymérisables par radicaux en une molécule, et (E-1) un initiateur de photopolymérisation de type oxime représenté par la formule générale (I).
(JA)  本発明は、最大波長が350nm~420nmのレーザー発振光源を用いたレーザー・ダイレクト・イメージング装置に適し、精細なブラックマトリックスパターンを効率良く形成するのに有用で、かつ保存安定性に優れたアルカリ現像型の黒色ペースト組成物、該組成物からなるブラックマトリックスパターン及び該ブラックマトリックスパターンを有するプラズマディスプレイパネル、並びに該ブラックマトリックスパターンの形成方法を提供することを目的とする。本発明に係るアルカリ現像型黒色ペースト組成物は、(A)カルボキシル基含有樹脂、(B)ガラスフリット、(C)黒色顔料、(D)一分子内に少なくとも一つ以上のラジカル重合性不飽和基を有する化合物、及び(E-1)一般式(I)で表わされるオキシム系光重合開始剤を含有してなる。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020080019289JPWO2007007800US20080118864CN101223478JP4834664