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1. (WO2007007746) EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/007746    International Application No.:    PCT/JP2006/313758
Publication Date: 18.01.2007 International Filing Date: 11.07.2006
IPC:
H01L 21/027 (2006.01), G03F 7/20 (2006.01)
Applicants: NIKON CORPORATION [JP/JP]; 2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 1008331 (JP) (For All Designated States Except US).
MIZUTANI, Takeyuki [JP/JP]; (JP) (For US Only).
OKUMURA, Masahiko [JP/JP]; (JP) (For US Only).
KOHNO, Hirotaka [JP/JP]; (JP) (For US Only)
Inventors: MIZUTANI, Takeyuki; (JP).
OKUMURA, Masahiko; (JP).
KOHNO, Hirotaka; (JP)
Agent: SHIGA, Masatake; 2-3-1, Yaesu Chuo-ku, Tokyo 1048453 (JP)
Priority Data:
2005-201582 11.07.2005 JP
Title (EN) EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE
(FR) APPAREIL D’EXPOSITION ET PROCÉDÉ DE FABRICATION DU DISPOSITIF
(JA) 露光装置及びデバイス製造方法
Abstract: front page image
(EN)Disclosed is an exposure apparatus (EX) comprising a first stage (WST) and a second stage (MST). A maintenance device (55) performs maintenance of the second stage (MST) during an exposure process of a wafer (W) held on the first stage.
(FR)La présente invention concerne un appareil d’exposition (EX) comprenant un premier étage (WST) et un second étage (MST). Un dispositif de maintenance (55) effectue la maintenance du second étage (MST) pendant le processus d’exposition d’une galette (W) maintenue sur le premier étage (WST).
(JA) 露光装置(EX)は、第1ステージ(WST)と、第2ステージ(MST)とを備える。メンテナンス装置(55)は、第1ステージに保持されたウェハ(W)の露光処理の最中に第2ステージ(MST)のメンテナンスを行う。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)