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1. (WO2007007674) ELECTROSTATIC CHUCK AND ELECTRODE SHEET FOR ELECTROSTATIC CHUCK
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2007/007674 International Application No.: PCT/JP2006/313586
Publication Date: 18.01.2007 International Filing Date: 07.07.2006
Chapter 2 Demand Filed: 27.04.2007
IPC:
H01L 21/683 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683
for supporting or gripping
Applicants:
株式会社クリエイティブ テクノロジー CREATIVE TECHNOLOGY CORPORATION [JP/JP]; 〒1020083 東京都千代田区麹町1-8-14麹町YKビル5F Tokyo Koujimachi YK Bldg 5F, 1-8-14, Koujimachi, Chiyoda-ku, Tokyo 1020083, JP (AllExceptUS)
宮下 欣也 MIYASHITA, Kinya [JP/JP]; JP (UsOnly)
藤澤 博 FUJISAWA, Hiroshi [JP/JP]; JP (UsOnly)
原野 理一郎 HARANO, Riichiro [JP/JP]; JP (UsOnly)
Inventors:
宮下 欣也 MIYASHITA, Kinya; JP
藤澤 博 FUJISAWA, Hiroshi; JP
原野 理一郎 HARANO, Riichiro; JP
Agent:
成瀬 勝夫 NARUSE, Katsuo; 〒1050003 東京都港区西新橋2丁目11番5号 TKK西新橋ビル5階 Tokyo 5th Floor, TKK Nishishinbashi Bldg. 11-5, Nishi-shinbashi 2-chome Minato-ku, Tokyo 1050003, JP
Priority Data:
2005-20073908.07.2005JP
2005-35764112.12.2005JP
Title (EN) ELECTROSTATIC CHUCK AND ELECTRODE SHEET FOR ELECTROSTATIC CHUCK
(FR) MANDRIN ÉLECTROSTATIQUE ET FEUILLE D’ÉLECTRODE POUR MANDRIN ÉLECTROSTATIQUE
(JA) 静電チャック及び静電チャック用の電極シート
Abstract:
(EN) An electrostatic chuck having excellent attracting power and holding power is provided. The electrostatic chuck is provided with a multilayer structure wherein a first insulating layer, a first electrode layer, an interelectrode insulating layer, a second electrode layer and a second insulating layer are successively stacked on a metal base from a level close to the metal base. The second electrode layer has a plurality of openings in a prescribed flat plane region. The electrostatic chuck is composed of a pattern electrode satisfying inequalities of L/X≥1.5 and L<2.6mm, where, X is a shortest distance between the adjoining openings, and L is a length of a line obtained by a foot of a perpendicular obtained when the gravity centers of the adjoining openings are projected to a virtual line parallel to the shortest distance X.
(FR) L’invention concerne un mandrin électrostatique ayant un excellent pouvoir d’attraction et de maintien. Le mandrin électrostatique est pourvu d’une structure multicouche selon laquelle une première couche isolante, une première couche d’électrode, une couche isolante interélectrode, une seconde couche d’électrode et une seconde couche isolante sont empilées de manière successive sur un socle de métal à partir d’un niveau proche du socle de métal. La seconde couche d’électrode possède une pluralité d’ouvertures dans une région plate prescrite. Le mandrin électrostatique se compose d’une électrode à motif satisfaisant aux inégalités de L/X≥1,5 et L<2,6mm, où X est une distance la plus courte entre les ouvertures contiguës, et L est une longueur de segment obtenue par un pied d’une verticale observée lorsque les centres de gravité des ouvertures contiguës font saillie vers une ligne virtuelle parallèle à la distance la plus courte X.
(JA)  優れた吸着力及び保持力を発揮する静電チャックを提供する。  金属基盤上に、この金属基盤から近い順に第一絶縁層、第一電極層、電極間絶縁層、第二電極層、及び第二絶縁層が順次積層された積層構造を有する静電チャックであって、上記第二電極層が、所定の平面領域内に複数の開口部を有し、かつ、互いに隣接する上記開口部の最短距離Xと、この最短距離Xに平行な直線を仮想直線としてこの仮想直線に対しこれら隣接する開口部の重心をそれぞれ投影した際の垂線の足により得られる線分の長さLとが、L/X≧1.5の関係を有すると共に、L<2.6mmであるパターン電極からなる静電チャックである。
front page image
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020080038333EP1909308US20090041980CN101218668JP4928454