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1. (WO2007007592) POLYOL COMPOSITION CONTAINING FINE PARTICLES DISPERSED THEREIN, PROCESS FOR PRODUCTION OF POLYMERIC POLYOLS, AND PROCESS FOR PRODUCTION OF POLYURETHANE RESINS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2007/007592 International Application No.: PCT/JP2006/313312
Publication Date: 18.01.2007 International Filing Date: 04.07.2006
IPC:
C08L 71/02 (2006.01) ,C08F 2/18 (2006.01) ,C08G 18/00 (2006.01) ,C08L 101/00 (2006.01) ,C08G 101/00 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
71
Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
02
Polyalkylene oxides
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2
Processes of polymerisation
12
Polymerisation in non-solvents
16
Aqueous medium
18
Suspension polymerisation
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
18
Polymeric products of isocyanates or isothiocyanates
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
101
Compositions of unspecified macromolecular compounds
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
101
Manufacture of cellular products
Applicants:
三洋化成工業株式会社 SANYO CHEMICAL INDUSTRIES, LTD. [JP/JP]; 〒6050995 京都府京都市東山区一橋野本町11番地の1 Kyoto 11-1, Ikkyonomoto-cho, Higashiyama-ku, Kyoto-shi, Kyoto 6050995, JP (AllExceptUS)
中田繁邦 NAKADA, Shigekuni; null (UsOnly)
渡部弘之 WATANABE, Hiroyuki; null (UsOnly)
辻隆之 TSUJI, Takayuki; null (UsOnly)
森洋毅 MORI, Hiroki; null (UsOnly)
Inventors:
中田繁邦 NAKADA, Shigekuni; null
渡部弘之 WATANABE, Hiroyuki; null
辻隆之 TSUJI, Takayuki; null
森洋毅 MORI, Hiroki; null
Agent:
特許業務法人池内・佐藤アンドパートナーズ IKEUCHI SATO & PARTNER PATENT ATTORNEYS; 〒5306026 大阪府大阪市北区天満橋1丁目8番30号OAPタワー26階 Osaka 26th Floor, OAP TOWER 8-30, Tenmabashi 1-chome Kita-ku, Osaka-shi Osaka 5306026, JP
Priority Data:
2005-19941707.07.2005JP
2005-37095322.12.2005JP
Title (EN) POLYOL COMPOSITION CONTAINING FINE PARTICLES DISPERSED THEREIN, PROCESS FOR PRODUCTION OF POLYMERIC POLYOLS, AND PROCESS FOR PRODUCTION OF POLYURETHANE RESINS
(FR) COMPOSITION DE POLYOL CONTENANT DE FINES PARTICULES DISPERSÉES, PROCÉDÉ DE FABRICATION DE POLYOLS POLYMÈRES, ET PROCÉDÉ DE FABRICATION DE RÉSINES DE POLYURÉTHANE
(JA) 微粒子分散ポリオール組成物、重合体ポリオールの製造方法、およびポリウレタン樹脂の製法
Abstract:
(EN) A polyol composition comprising a polyol (a) and the following resin fine particles (b) dispersed therein; and a process for the production thereof: resin fine particles (b): particles having an arithmetic standard deviation by volume of particle size distribution of 0.6 or below as determined by use of a laser diffraction/scattering particle size distribution analyzer with 85 divisions in the range of 0.020 to 2000μm. The invention provides a polyol composition containing resin fine particles dispersed therein which can give polyurethane resins excellent in mechanical strengths such as elongation at break even when the resin particles have small diameters; and a process for the production of the composition.
(FR) La présente invention concerne une composition de polyol comprenant un polyol (a) et les fines particules de résine (b) suivantes qui y sont dispersées ; et son procédé de fabrication : fines particules de résine (b) : particules ayant un écart-type arithmétique en volume de la distribution granulométrique inférieur ou égal à 0,6 tel que déterminé par l’utilisation d’un analyseur de distribution granulométrique à diffraction/diffusion laser avec 85 divisions dans la plage comprise entre 0,020 et 2000 µm. L’invention prévoit une composition de polyol contenant de fines particules de résine dispersées dans la composition qui peuvent permettre d’obtenir des résines de polyuréthane excellentes en matière de résistances mécaniques telles que l’élongation à la rupture même lorsque les particules de résine ont depetits diamètres ; et un procédé de fabrication de la composition.
(JA)  ポリオール(a)中に下記樹脂微粒子(b)が分散されてなるポリオール組成物ならびにその製造方法を提供する。  樹脂微粒子(b):レーザー回折/散乱式粒度分布測定装置による、0.020~2000μmの範囲を85分割した際の粒度分布の体積基準による算術標準偏差が0.6以下である粒子。  ポリオール中に分散している樹脂粒子の粒子径が小さくても、切断伸度等の機械強度に優れたポリウレタン樹脂を製造できる樹脂微粒子分散ポリオール組成物並びにその製造方法を提供する。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
EP1921113RU02380388US20090018227CN101218299