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1. (WO2007007580) VIBRATION ISOLATION DEVICE AND VIBRATION ISOLATION METHOD
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2007/007580 International Application No.: PCT/JP2006/313243
Publication Date: 18.01.2007 International Filing Date: 03.07.2006
Chapter 2 Demand Filed: 28.02.2007
IPC:
F16F 15/02 (2006.01) ,B23Q 1/00 (2006.01) ,B23Q 11/00 (2006.01) ,G03F 7/20 (2006.01) ,H01L 21/027 (2006.01)
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
16
ENGINEERING ELEMENTS OR UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
F
SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
15
Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
02
Suppression of vibrations of non-rotating, e.g. reciprocating, systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating system
B PERFORMING OPERATIONS; TRANSPORTING
23
MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
Q
DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL, CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
1
Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
B PERFORMING OPERATIONS; TRANSPORTING
23
MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
Q
DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL, CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
11
Accessories fitted to machine tools for keeping tools or parts of the machine in good working condition or for cooling work; Safety devices specially combined with or arranged in, or specially adapted for use in connection with, machine tools
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
Applicants:
国立大学法人 埼玉大学 National university corporation SAITAMA UNIVERSITY [JP/JP]; 〒3388570 埼玉県さいたま市桜区下大久保255 Saitama 255, Shimo-Okubo, Sakura-ku, Saitama City, Saitama 3388570, JP (AllExceptUS)
水野 毅 MIZUNO, Takeshi [JP/JP]; JP (UsOnly)
Inventors:
水野 毅 MIZUNO, Takeshi; JP
Agent:
大橋 公治 OHASHI, Koji; 〒1400013 東京都品川区南大井六丁目16番12号 大森コーポビアネーズ504号 大橋特許事務所 Tokyo OhashiPatentOffice Omorikopobianezu #504 16-12, Minamioi 6-chome Sinagawa-ku Tokyo1400013, JP
Priority Data:
2005-20407613.07.2005JP
Title (EN) VIBRATION ISOLATION DEVICE AND VIBRATION ISOLATION METHOD
(FR) DISPOSITIF ET PROCÉDÉ D’ISOLATION CONTRE LES VIBRATIONS
(JA) 除振装置及び除振方法
Abstract:
(EN) [PROBLEMS] To provide a low cost vibration isolation device capable of isolating vibration caused by ground motion disturbance and direct acting disturbance and realizing zero-compliance over a wide load range. [MEANS FOR SOLVING PROBLEMS] This vibration isolation device comprises a support mechanism supporting a vibration-isolated member (34) having an active first support mechanism (31) with an actuator and a low rigid second support mechanism (32) arranged in series with the first support mechanism (31). The displacement of the actuator of the first support mechanism (31) is controlled to offset the displacement of the second support mechanism (32). Accordingly, even if the vibration due to the ground motion disturbance and the direct acting disturbance occurs, the position of the vibration-isolated member (34) is not changed. The vibration isolation device can isolate the vibration caused by the ground motion disturbance and the direct acting disturbance, realize the zero-compliance over the wide load range, and comprises high reliability. Furthermore, the vibration isolation device can be manufactured at low cost.
(FR) Le problème à résoudre dans le cadre de la présente invention est de proposer un dispositif d’isolation contre les vibrations qui est peu coûteux, capable d’isoler les vibrations entraînées par des perturbations de mouvement du sol et des perturbations à action directe et qui observe un niveau nul sur une plage de charge importante. La solution consiste en un dispositif d’isolation contre les vibrations qui comprend un mécanisme de support qui supporte un élément isolé des vibrations (34) qui comporte un premier mécanisme de support actif (31) avec un actionneur et un second mécanisme de support rigide bas (32) agencé en série avec le premier mécanisme de support (31). Le déplacement de l’actionneur du premier mécanisme de support (31) est commandé pour compenser le déplacement du second mécanisme de support (32). En conséquence, même en cas de vibrations entraînées par les perturbations de mouvement du sol et aux perturbations à action directe, la position de l’élément isolé des vibrations (34) ne change pas. Le dispositif d’isolation contre les vibrations peut isoler les vibrations entraînées par les perturbations de mouvement du sol et les perturbations à action directe, observer le niveau nul sur la plage de charge importante, et est très fiable. En outre, le dispositif d’isolation contre les vibrations peut être fabriqué à bas coût.
(JA)  【課題】 地動外乱及び直動外乱による振動の除振が可能で、且つ、広い荷重範囲に渡ってゼロコンプライアンスを実現できる、低コストの除振装置を提供する。  【解決手段】 本発明の除振装置は、除振対象物34を支持する支持機構が、アクチュエータを備えた能動型の第1の支持機構31と、第1の支持機構31と直列に配置された低剛性の第2の支持機構32とを有し、第1の支持機構31のアクチュエータの変位が、第2の支持機構32の変位を相殺するように制御される。そのため、地動外乱及び直動外乱による振動が発生しても、除振対象物34の位置は変動しない。この除振装置は、地動外乱及び直動外乱による振動の除振が可能であり、また、広い荷重範囲に渡ってゼロコンプライアンスを実現することができ、高い信頼性を有している。また、低コストでの製作が可能である。  
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Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)