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1. (WO2007007564) PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL, AND METHOD FOR IMAGE FORMATION WITH PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2007/007564 International Application No.: PCT/JP2006/313053
Publication Date: 18.01.2007 International Filing Date: 30.06.2006
IPC:
G03F 7/004 (2006.01) ,G03F 7/029 (2006.01) ,G03F 7/00 (2006.01) ,C08F 2/50 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
028
with photosensitivity-increasing substances, e.g. photoinitiators
029
Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2
Processes of polymerisation
46
Polymerisation initiated by wave energy or particle radiation
48
by ultra-violet or visible light
50
with sensitising agents
Applicants:
コニカミノルタエムジー株式会社 Konica Minolta Medical & Graphic, Inc. [JP/JP]; 〒1630512 東京都新宿区西新宿1丁目26番2号 Tokyo 26-2, Nishishinjuku 1-chome, Shinjuku-ku, Tokyo 1630512, JP (AllExceptUS)
松村 智之 MATSUMURA, Toshiyuki [JP/JP]; JP (UsOnly)
Inventors:
松村 智之 MATSUMURA, Toshiyuki; JP
Priority Data:
2005-20566314.07.2005JP
Title (EN) PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL, AND METHOD FOR IMAGE FORMATION WITH PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL
(FR) COMPOSITION PHOTOSENSIBLE, MATERIAU POUR PLAQUE D'IMPRESSION LITHOGRAPHIQUE PHOTOSENSIBLE, ET PROCEDE DE FORMATION D'IMAGE UTILISANT LE MATERIAU POUR PLAQUE D'IMPRESSION LITHOGRAPHIQUE PHOTOSENSIBLE
(JA) 感光性組成物、感光性平版印刷版材料および感光性平版印刷版材料の画像形成方法
Abstract:
(EN) This invention provides a photosensitive composition comprising (A) a polymerizable ethylenical double bond-containing compound, (B) a photopolymerization initiator, (C) a polymeric binder, and (D) a coloring matter having an absorption maximum wavelength of 350 to 450 nm, characterized in that the coloring matter (D) having an absorption maximum wavelength of 350 to 450 nm is a compound represented by general formula (1). There are also provided a photosensitive lithographic printing plate material, which is suitable for exposure with a laser beam in a luminescence wavelength range of 350 to 450 nm, and has excellent sensitivity and printing durability, and a method for image formation using the material.
(FR) Cette invention concerne une composition photosensible comprenant (A) un composé polymérisable contenant des doubles liaisons éthyléniques, (B) un amorceur de photopolymérisation, (C) un liant polymérique, et (D) un colorant présentant une longueur d'onde maximale d'absorption comprise entre 350 et 450 nm, caractérisée en ce que le colorant (D) présentant une longueur d'onde maximale d'absorption comprise entre 350 et 450 nm est un composé représenté par la formule générale (1). L'invention concerne également un matériau pour plaque d'impression lithographique photosensible, adapté à une exposition à un rayon laser dans une gamme de longueurs d'onde de luminescence allant de 350 à 450 nm, et présentant une excellente sensibilité et une excellente durabilité d'impression, ainsi qu'un procédé de formation d'image utilisant ce matériau. [Formule chimique 1] Formule générale (1)
(JA) not available
front page image
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)