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1. (WO2007007557) LITHOGRAPHIC PRINTING ORIGINAL PLATE AND IMAGE FORMING METHOD EMPLOYING IT
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2007/007557 International Application No.: PCT/JP2006/312931
Publication Date: 18.01.2007 International Filing Date: 22.06.2006
IPC:
G03F 7/095 (2006.01) ,G03F 7/00 (2006.01) ,G03F 7/004 (2006.01) ,G03F 7/11 (2006.01) ,G03F 7/32 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
09
characterised by structural details, e.g. supports, auxiliary layers
095
having more than one photosensitive layer
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
09
characterised by structural details, e.g. supports, auxiliary layers
11
having cover layers or intermediate layers, e.g. subbing layers
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26
Processing photosensitive materials; Apparatus therefor
30
Imagewise removal using liquid means
32
Liquid compositions therefor, e.g. developers
Applicants:
イーストマン コダック カンパニー Eastman Kodak Company [US/US]; 14650 ニューヨーク州ロチェスター,ステイト ストリート 343 New York 343 State Street, Rochester, New York 14650, US (AllExceptUS)
神谷 昌道 KAMIYA, Masamichi [JP/JP]; JP (UsOnly)
浅輪 泰浩 ASAWA, Yasuhiro [JP/JP]; JP (UsOnly)
宮本 靖 MIYAMOTO, Yasushi [JP/JP]; JP (UsOnly)
油野 丸 ABURANO, Maru [JP/JP]; JP (UsOnly)
早川 英次 HAYAKAWA, Eiji [JP/JP]; JP (UsOnly)
Inventors:
神谷 昌道 KAMIYA, Masamichi; JP
浅輪 泰浩 ASAWA, Yasuhiro; JP
宮本 靖 MIYAMOTO, Yasushi; JP
油野 丸 ABURANO, Maru; JP
早川 英次 HAYAKAWA, Eiji; JP
Agent:
青木 篤 AOKI, Atsushi; 〒1058423 東京都港区虎ノ門三丁目5番1号 虎ノ門37森ビル 青和特許法律事務所 Tokyo SEIWA PATENT & LAW Toranomon 37 Mori Bldg. 5-1, Toranomon 3-chome Minato-ku, Tokyo 1058423, JP
Priority Data:
2005-20230611.07.2005JP
Title (EN) LITHOGRAPHIC PRINTING ORIGINAL PLATE AND IMAGE FORMING METHOD EMPLOYING IT
(FR) PLAQUE ORIGINALE POUR IMPRESSION LITHOGRAPHIQUE ET PROCÉDÉ DE FORMATION D’IMAGE L’UTILISANT
(JA) 平版印刷版原版及びそれを用いた画像形成方法
Abstract:
(EN) An infrared ray sensitive or thermal lithographic printing original plate having high plate antiwear and good development characteristics in which development latitude is wide and nothing is deposited during development. In the lithographic printing original plate comprising a substrate, a first image recording layer formed on the substrate, and a second image recording layer formed on the first image recording layer, the first image recording layer contains resin soluble or dispersible to alkaline aqueous solution and the second image recording layer contains polyurethane including a substituent having an acid hydrogen atom.
(FR) Cette invention concerne une plaque originale pour impression lithographique thermique ou par infrarouge offrant une résistance élevée à l’usure et de bonnes caractéristiques de développement, c’est-à-dire que la plage de développement est étendue et que rien ne se dépose pendant le développement. La plaque originale pour impression lithographique comprend un substrat, une première couche d'impression d'image formée sur ledit substrat et une seconde couche d’impression d’image formée sur la première, la première couche d’impression d’image contenant de la résine soluble ou dispersible dans les solutions aqueuses alcalines et la seconde couche d'impression d'image contenant un polyuréthane incluant un substituant ayant un atome d’hydrogène acide.
(JA) 高い耐刷性を有し、且つ、現像ラチチュードが広く、現像中に堆積物の発生のない、良好な現像特性を有する赤外線感受性又は感熱性の平版印刷版原版を提供すること。基板と、基板上に形成された第1の画像記録層と、第1の画像記録層上に形成された第2の画像記録層とを含んで成る平版印刷版原版において、第1の画像記録層がアルカリ性水溶液に可溶性又は分散性の樹脂を含み、第2の画像記録層が酸性水素原子を持つ置換基を有するポリウレタンを含む。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
EP1903396US20090208869CN101223480CN103832050