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1. (WO2007007513) PATTERN FORMING METHOD
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2007/007513 International Application No.: PCT/JP2006/312115
Publication Date: 18.01.2007 International Filing Date: 16.06.2006
IPC:
G03F 7/20 (2006.01) ,G03F 7/033 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032
with binders
033
the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 〒1068620 東京都港区西麻布2丁目26番30号 Tokyo 26-30, Nishiazabu 2-chome Minato-ku, Tokyo 106-8620, JP (AllExceptUS)
高島 正伸 TAKASHIMA, Masanobu [JP/JP]; JP (UsOnly)
岡崎 洋二 OKAZAKI, Yoji [JP/JP]; JP (UsOnly)
石川 弘美 ISHIKAWA, Hiromi [JP/JP]; JP (UsOnly)
Inventors:
高島 正伸 TAKASHIMA, Masanobu; JP
岡崎 洋二 OKAZAKI, Yoji; JP
石川 弘美 ISHIKAWA, Hiromi; JP
Agent:
廣田 浩一 HIROTA, Koichi; 〒1510053 東京都渋谷区代々木2-2-13 新宿TRビル4階 山の手合同国際特許事務所 Tokyo HIROTA, NAGARE & ASSOCIATES 4th Floor, Shinjuku TR Bldg. 2-2-13, Yoyogi Shibuya-ku, Tokyo 1510053, JP
Priority Data:
2005-19945207.07.2005JP
Title (EN) PATTERN FORMING METHOD
(FR) PROCÉDÉ DE FORMATION DE MOTIF
(JA) パターン形成方法
Abstract:
(EN) A pattern forming method for highly accurately and efficiently forming a permanent pattern such as a wiring pattern by improving exposure performance without causing cost increase of an apparatus nor exposure speed deterioration. The pattern forming method includes at least exposure wherein light from a light irradiation means is modulated to a photosensitive layer by a light modulating means which receives the light from the light irradiation means and modulates the light based on pattern information, and that the light modulated by the light modulating means is permitted to form an image on a plane of the photosensitive layer to be exposed through an imaging means and a focal point adjusting means. In the exposure, the light modulated by the light modulating means is permitted to form the image only in a substantially rectangular region including a center portion of the imaging means, and a short side direction of the substantially rectangular shape is directed toward the swell direction of the photosensitive layer.
(FR) La présente invention concerne un procédé de formation de motif pour former de manière hautement précise et efficace un motif permanent tel qu'un motif de câblage en améliorant les prestations d'exposition sans causer d'augmentation de coût d'un appareil ni de dégradation de la vitesse d'exposition. Le procédé de formation de motif inclut au moins une exposition lors de laquelle une lumière en provenance de moyens d'irradiation de lumière est modulée en direction d'une couche photosensible par des moyens de modulation de lumière qui reçoivent la lumière en provenance des moyens d'irradiation de lumière et modulent la lumière sur la base d'informations concernant un motif, ce qui permet à la lumière modulée par les moyens de modulation de lumière de former une image sur un plan de la couche photosensible à exposer par le biais de moyens de traitement d'image et de moyens de réglage de foyer. Lors de l'exposition, on permet à la lumière modulée par les moyens de modulation de lumière de former l'image uniquement dans une région pratiquement rectangulaire incluant une partie centrale des moyens de traitement d'image, et une direction d'un côté court de la forme pratiquement rectangulaire est orientée vers la direction de grossissement de la couche photosensible.
(JA)  本発明は、装置のコストアップや、露光速度の低下を招くことなく、露光性能を向上させることにより、配線パターン等の永久パターンを高精細に、かつ、効率よく形成可能なパターン形成方法を提供する。  このため、感光層に対し、光照射手段からの光を受光してパターン情報に基づいて変調する光変調手段により、前記光照射手段からの光を変調させ、前記光変調手段により変調された光を、結像手段と、焦点調節手段とを介して前記感光層の被露光面上に結像させて露光を行うことを少なくとも含み、前記露光が、前記光変調手段により変調された光を、前記結像手段の中央部を含む略矩形状の領域のみにおいて結像し、前記略矩形状の短辺方向を、前記感光層のうねり方向に向けて行われることを特徴とするパターン形成方法を提供する。
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Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020080026548CN101218546