Search International and National Patent Collections
Some content of this application is unavailable at the moment.
If this situation persists, please contact us atFeedback&Contact
1. (WO2007007512) PATTERN FORMING METHOD
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2007/007512 International Application No.: PCT/JP2006/312095
Publication Date: 18.01.2007 International Filing Date: 16.06.2006
IPC:
G03F 7/20 (2006.01) ,G03F 7/033 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032
with binders
033
the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Applicants:
富士フイルム株式会社 FUJIFILM Corporation [JP/JP]; 〒1068620 東京都港区西麻布2丁目26番30号 Tokyo 26-30, Nishiazabu 2-chome Minato-ku, Tokyo 1068620, JP (AllExceptUS)
高島 正伸 TAKASHIMA, Masanobu [JP/JP]; JP (UsOnly)
小森 一樹 KOMORI, Kazuki [JP/JP]; JP (UsOnly)
石川 弘美 ISHIKAWA, Hiromi [JP/JP]; JP (UsOnly)
岡崎 洋二 OKAZAKI, Yoji [JP/JP]; JP (UsOnly)
大森 利彦 OMORI, Toshihiko [JP/JP]; JP (UsOnly)
Inventors:
高島 正伸 TAKASHIMA, Masanobu; JP
小森 一樹 KOMORI, Kazuki; JP
石川 弘美 ISHIKAWA, Hiromi; JP
岡崎 洋二 OKAZAKI, Yoji; JP
大森 利彦 OMORI, Toshihiko; JP
Agent:
廣田 浩一 HIROTA, Koichi; 〒1510053 東京都渋谷区代々木2-2-13 新宿TRビル4階山の手合同国際特許事務所 Tokyo HIROTA, NAGARE & ASSOCIATES 4th Floor, Shinjuku TR Bldg. 2-2-13, Yoyogi Shibuya-ku, Tokyo 151-0053, JP
Priority Data:
2005-19946107.07.2005JP
Title (EN) PATTERN FORMING METHOD
(FR) PROCEDE DE FORMATION DE MOTIF
(JA) パターン形成方法
Abstract:
(EN) Provided is a pattern forming method by which a fine pattern can be accurately formed by making a light quantity of each exposure unit uniform while suppressing cost, for exposure using a digital exposure apparatus having an exposure head wherein the exposure units are two-dimensionally distributed. The method at least includes a step wherein a photosensitive layer is irradiated with optical beams emitted from a light irradiation means, through a focusing optical system having a light distribution correcting means, and exposure is performed by irradiating the photosensitive layer with optical beams modulated by a light modulating means. In the pattern forming method, the exposure is performed by permitting light quantities of the optical beams applied on the light modulating means from the light irradiation means in an irradiation area to have distribution, and that the light quantity distribution of the optical beams modulated by the light modulating means is corrected to be uniform on the plane of the photosensitive layer to be exposed.
(FR) L’invention concerne un procédé de formation de motif permettant de former avec précision et de façon économique un motif fin par uniformisation de l’intensité de lumière de chacun d’une pluralité de modules d’exposition répartis de façon bidimensionnelle sur la tête d’exposition d’un appareil d’exposition numérique. Le procédé comporte au moins une étape consistant à projeter sur une couche photosensible des faisceaux optiques émis par un moyen de projection de lumière, à travers un système de focalisation optique doté d’un moyen de correction de distribution de lumière. Une exposition est réalisée en projetant sur la couche photosensible des faisceaux optiques modulés par un moyen de modulation de lumière. Le procédé de formation de motif est caractérisé en ce que l’exposition est réalisée par distribution des intensités de lumière des faisceaux optiques issus du moyen de projection de lumière appliqués au moyen de modulation optique sur une surface de projection, et en ce que la distribution des intensités de lumière des faisceaux optiques modulés par le moyen de modulation de lumière est corrigée de façon à être uniforme sur le plan de la couche photosensible à exposer.
(JA)  本発明は、描画単位が2次元的に分布した露光ヘッドを備えるデジタル露光装置を用いた露光において、コストを抑えつつ、各描画単位の光量を均一化することにより、微細なパターンを高精度に形成可能なパターン形成方法を提供する。  このため、感光層に対し、光照射手段から出射した光ビームを、光分布補正手段を有する集光光学系を介して照射し、前記光変調手段により変調された光ビームを照射して露光を行うことを少なくとも含み、該露光が、前記光照射手段から前記光変調手段に照射される光ビームの照射領域内での光量に分布を持たせ、前記光変調手段により変調された光ビームの光量分布が、前記感光層の被露光面上において均一となるように補正されて行われるパターン形成方法を提供する。
front page image
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020080034124CN101218545