WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2007004564) METHOD OF DIMINISHING ORGANOCHLORINE COMPOUND IN CEMENT PRODUCTION EQUIPMENT AND CEMENT PRODUCTION EQUIPMENT
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/004564    International Application No.:    PCT/JP2006/313101
Publication Date: 11.01.2007 International Filing Date: 30.06.2006
IPC:
C04B 7/60 (2006.01), B01D 53/70 (2006.01), C04B 7/44 (2006.01)
Applicants: MITSUBISHI MATERIALS CORPORATION [JP/JP]; 5-1, Otemachi 1-chome, Chiyoda-ku, Tokyo 1008117 (JP) (For All Designated States Except US).
ICHIHARA, Katsuhiko [JP/JP]; (JP) (For US Only).
KOIKE, Eiji [JP/JP]; (JP) (For US Only).
OHGOSHI, Munenori [JP/JP]; (JP) (For US Only).
TANAKA, Hisanobu [JP/JP]; (JP) (For US Only).
EBATO, Ichiro [JP/JP]; (JP) (For US Only).
MIZUTANI, Kimitoshi [JP/JP]; (JP) (For US Only)
Inventors: ICHIHARA, Katsuhiko; (JP).
KOIKE, Eiji; (JP).
OHGOSHI, Munenori; (JP).
TANAKA, Hisanobu; (JP).
EBATO, Ichiro; (JP).
MIZUTANI, Kimitoshi; (JP)
Agent: SHIGA, Masatake; 2-3-1, Yaesu, Chuo-ku, Tokyo 1048453 (JP)
Priority Data:
2005-192353 30.06.2005 JP
2005-230079 08.08.2005 JP
2005-260189 08.09.2005 JP
Title (EN) METHOD OF DIMINISHING ORGANOCHLORINE COMPOUND IN CEMENT PRODUCTION EQUIPMENT AND CEMENT PRODUCTION EQUIPMENT
(FR) PROCÉDÉ DE DIMINUTION DES COMPOSÉS ORGANOCHLORÉS DANS UN APPAREIL DE PRODUCTION DE CIMENT ET APPAREIL DE PRODUCTION DE CIMENT
(JA) セメント製造設備における有機塩素化合物の低減方法、およびセメント製造設備
Abstract: front page image
(EN)A method of diminishing organochlorine compounds in cement production equipment by which the amount of organochlorine compounds contained in a raw cement material is reduced in the cement production equipment. The method comprises: an organic-matter adsorption step in which an adsorbent powder is supplied to a discharge gas generated by burning the raw cement material to produce a cement clinker to thereby adsorb the organochlorine compounds onto the adsorbent powder; and an adsorbent-powder removal step in which the adsorbent powder having the organochlorine compounds adsorbed thereon is collected and removed from the discharge gas.
(FR)La présente invention concerne un procédé permettant de diminuer les composés organochlorés dans un appareil de production de ciment par lequel la quantité de composés organochlorés contenus dans le ciment brut est réduite dans l'appareil de production de ciment. Ledit procédé comprend : une étape d'adsorption des matières organiques pendant laquelle une poudre adsorbante est envoyée dans un gaz de décharge généré lorsque l'on fait brûler le ciment brut pour produire un clinker de ciment, les composés organochlorés étant ainsi adsorbés sur la poudre adsorbante ; et une étape d'élimination de la poudre adsorbante pendant laquelle la poudre adsorbante sur laquelle sont adsorbés les composés organochlorés est recueillie et éliminée du gaz de décharge.
(JA) 本発明のセメント製造設備における有機塩素化合物の低減方法は、セメント原料に含まれる有機塩素化合物の量を、セメント製造設備において低減させるセメント製造設備における有機塩素化合物の低減方法であって、前記セメント原料からセメントクリンカを焼成する際に発生した排ガス中に吸着粉を供給し、前記吸着粉に前記有機塩素化合物を吸着させる有機物吸着工程と、前記有機塩素化合物を吸着した前記吸着粉を捕集し、前記排ガス中から前記吸着粉を除去する吸着粉除去工程とを備える。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)