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1. (WO2007004396) METHOD FOR MANUFACTURING ELECTROPHORETIC DISPLAY MEDIUM, AND ELECTROPHORETIC DISPLAY MEDIUM
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2007/004396 International Application No.: PCT/JP2006/311923
Publication Date: 11.01.2007 International Filing Date: 14.06.2006
IPC:
G02F 1/167 (2006.01)
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
167
based on electrophoresis
Applicants:
ブラザー工業株式会社 BROTHER KOGYO KABUSHIKI KAISHA [JP/JP]; 〒4678561 愛知県名古屋市瑞穂区苗代町15番1号 Aichi 15-1, Naeshiro-cho, Mizuho-ku, Nagoya-shi, Aichi 4678561, JP (AllExceptUS)
豊田 嘉人 TOYODA, Yoshito [JP/JP]; JP (UsOnly)
Inventors:
豊田 嘉人 TOYODA, Yoshito; JP
Agent:
北澤 一浩 KITAZAWA, Kazuhiro; 〒1130034 東京都文京区湯島3丁目37番4号 シグマ湯島ビル6階 Tokyo 6F, First Genesis Bldg. 31-14, Yushima 2-chome Bunkyo-ku, Tokyo 113-0034, JP
Priority Data:
2005-19146230.06.2005JP
Title (EN) METHOD FOR MANUFACTURING ELECTROPHORETIC DISPLAY MEDIUM, AND ELECTROPHORETIC DISPLAY MEDIUM
(FR) PROCÉDÉ DE FABRICATION D'UN MOYEN D'AFFICHAGE ÉLECTROPHORÉTIQUE ET CE DERNIER
(JA) 電気泳動表示媒体の製造方法及び電気泳動表示媒体
Abstract:
(EN) A first substrate (120) and a second substrate (110) are arranged by having at least a distance between a plane, which is of a partitioning member (123) arranged on the first substrate (120) and faces the second substrate (110), and the second substrate (110) to be wide when charged particles (305) are applied and to be narrow when being sealed or displaying an image so that the charged particles (305) do not freely pass through.
(FR) La présente invention concerne un premier substrat (120) et un second substrat (110) qui sont disposés en ayant au moins une distance entre un plan, constitué d'un élément de séparation (123) disposé sur le premier substrat (120) et faisant face au second substrat (110), et le second substrat (110) étant large lorsque des particules chargées (305) sont appliquées et étant étroite lors de son obturation ou de l'affichage d'une image de manière à ce que les particules chargées (305) ne traversent pas librement.
(JA)  少なくとも第一基板(120)に設けられた区画部材(123)における第二基板(110)と対向する面と、第二基板(110)との距離を、荷電粒子(305)の充填時には広く、封止時及び画像表示時には前記荷電粒子(305)が自由に通過することが出来ないように狭くして、前記第一基板(120)、第二基板(110)を配置する。  
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Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)