WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2007002871) A METHOD FOR PROCESSING A MEMS/CMOS CANTILEVER BASED MEMORY STORAGE DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/002871    International Application No.:    PCT/US2006/025472
Publication Date: 04.01.2007 International Filing Date: 28.06.2006
IPC:
G11B 9/00 (2006.01)
Applicants: INTEL CORPORATION [US/US]; 2200 Mission College Boulevard, Santa Clara, California 95052 (US) (For All Designated States Except US).
BAR-SADEH, Eyal [IL/IL]; (IL) (For US Only).
CHO, Tsung-Kuan [--/US]; (US) (For US Only).
RAO, Valluri [US/US]; (US) (For US Only).
MURALI, Krishnamurthy [US/US]; (US) (For US Only)
Inventors: BAR-SADEH, Eyal; (IL).
CHO, Tsung-Kuan; (US).
RAO, Valluri; (US).
MURALI, Krishnamurthy; (US)
Agent: VINCENT, Lester J.; BLAKELY SOKOLOFF TAYLOR & ZAFMAN, 12400 Wilshire Boulevard, 7th Floor, Los Angeles, California 90025 (US)
Priority Data:
11/168,195 28.06.2005 US
Title (EN) A METHOD FOR PROCESSING A MEMS/CMOS CANTILEVER BASED MEMORY STORAGE DEVICE
(FR) PROCEDE DE TRAITEMENT D'UN DISPOSITIF DE STOCKAGE EN MEMOIRE REPOSANT SUR DES MICROLEVIERS MEMS/CMOS
Abstract: front page image
(EN)A method is disclosed. The method includes fabricating microelectromechanical (MEMS) structures of a Seek and Scan Probe (SSP) memory device on a first wafer, and fabricating CMOS and memory medium components of the SSP memory device on a second wafer.
(FR)L'invention concerne un procédé consistant à fabriquer des structures microélectromécaniques (MEMS) d'un dispositif mémoire à sonde de recherche et de balayage (SSP) sur une première plaquette et à fabriquer des composants de support de stockage et CMOS du dispositif mémoire SSP sur une seconde plaquette.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)