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1. (WO2007002740) BUFFER COMPOSITIONS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/002740    International Application No.:    PCT/US2006/025136
Publication Date: 04.01.2007 International Filing Date: 28.06.2006
IPC:
H01B 1/00 (2006.01), H01B 1/02 (2006.01), H01B 1/12 (2006.01), H01J 1/62 (2006.01), H01L 29/08 (2006.01), H01L 35/24 (2006.01), H01L 51/00 (2006.01)
Applicants: E. I. DU PONT DE NEMOURS AND COMPANY [US/US]; 1007 Market Street, Wilmington, Delaware 19898 (US) (For All Designated States Except US).
HSU, Che-hsiung [US/US]; (US) (For US Only).
SKULASON, Hjalti [IS/US]; (US) (For US Only).
MARTELLO, Mark, T. [US/US]; (US) (For US Only)
Inventors: HSU, Che-hsiung; (US).
SKULASON, Hjalti; (US).
MARTELLO, Mark, T.; (US)
Agent: LAMMING, John, H.; E. I. du Pont de Nemours and Company, Legal Patent Records Center, 4417 Lancaster Pike, Wilmington, Delaware 19805 (US)
Priority Data:
60/694,794 28.06.2005 US
Title (EN) BUFFER COMPOSITIONS
(FR) COMPOSITIONS TAMPONS
Abstract: front page image
(EN)Buffer compositions comprising semiconductive oxide particles and at least one of (a) a fluorinated acid polymer and (b) a semiconductive polymer doped with a fluorinated acid polymer are provided. Semiconductive oxide particles include metal oxides and bimetallic oxides. Acid polymers are derived from monomers or comonomers of polyolefins, polyacrylates, polymethacrylates, polyimides, polyamides, polyaramids, polyacrylamides, polystyrenes. The polymer backbone, side chains, pendant groups or combinations thereof may be fluorinated or highly fluorinated. Semiconductive polymers include polymers or copolymers derived from thiophenes, pyrroles, anilines, and polycyclic heteroaromatics. Methods for preparing buffer compositions are also provided.
(FR)L'invention concerne des compositions tampons contenant des particules d'oxyde semiconductrices et au moins (a) un polymère d'acide fluoré et (b) un polymère semiconducteur dopé d'un polymère d'acide fluoré. Les particules d'oxyde semiconductrices contiennent des oxydes métalliques et des oxydes bimétalliques. Les polymères d'acide sont dérivés de monomères ou de comonomères de polyoléfines, de polyacrylates, de polyméthacrylates, de polyimides, de polyamides, de polyaramides, de polyacrylamides, de polystyrènes. Le squelette du polymère, les chaînes latérales, les groupes pendants ou les combinaisons de ceux-ci peuvent être fluorés ou hautement fluorés. Les polymères semiconducteurs contiennent des polymères ou des copolymères dérivés de thiophènes, de pyrroles, d'anilines, et des groupes hétéroaromatiques polycycliques. L'invention concerne enfin des procédés de préparation de compositions tampons.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, ME, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)