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Machine translation
1. (WO2007001699) TRANPARENT MICROPOROUS MATERIALS FOR CMP
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/001699    International Application No.:    PCT/US2006/020193
Publication Date: 04.01.2007 International Filing Date: 24.05.2006
IPC:
B24B 37/04 (2006.01), B24D 3/32 (2006.01), B24D 13/12 (2006.01)
Applicants: CABOT MICROELECTRONICS CORPORATION [US/US]; 870 North Commons Drive, Aurora, IL 60504 (US)
Inventors: PRASAD, Abaneshwar; (US)
Agent: WESEMAN, Steven; Legal Department, Cabot Microelectronics Corporation, 870 North Commons Drive, Aurora, IL 60504 (US)
Priority Data:
11/158,694 22.06.2005 US
Title (EN) TRANPARENT MICROPOROUS MATERIALS FOR CMP
(FR) MATERIAUX MICROPOREUX TRANSPARENTS POUR POLISSAGE CHIMICO-MECANIQUE
Abstract: front page image
(EN)The invention is directed to a chemical-mechanical polishing pad substrate comprising a microporous closed-cell foam characterized by a narrow pore size distribution in the range of 0.01 microns to 10 microns. The polishing pad is produced by foaming a solid polymer sheet with a supercritical gas under an elevated temperature and pressure until the sheet is saturated with gas. The invention is further directed to a polishing pad comprising the polishing pad substrate, a method of polishing comprising the use of the polishing pad substrate, and a chemical-mechanical apparatus comprising the polishing pad substrate.
(FR)L'invention concerne un substrat de tampon de polissage chimico-mécanique comprenant une mousse microporeuse à cellules fermées caractérisée par une plage porométrique étroite comprise entre 0,01 et 10 microns. Le tampon de polissage est produit par moussage d'une feuille polymère solide à l'aide d'un gaz supercritique dans des conditions de température et de pression élevées jusqu'à ce que ladite feuille soit saturée en gaz. L'invention concerne également un tampon de polissage comprenant un substrat de tampon de polissage, un procédé de polissage consistant à utiliser ledit substrat de tampon de polissage, et un appareil chimico-mécanique comprenant le substrat de tampon de polissage.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)