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Machine translation
1. (WO2007001536) POLYESTER COMPOSITIONS COMPRISING MINIMAL AMOUNTS OF 2, 2, 4, 4, -TETRAMETHYL-1, 3-CYCLOBUTANEDIOL
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/001536    International Application No.:    PCT/US2006/011701
Publication Date: 04.01.2007 International Filing Date: 30.03.2006
IPC:
C08G 63/18 (2006.01)
Applicants: EASTMAN CHEMICAL COMPANY [US/US]; 100 North Eastman Road, Kingsport, Tennessee 37660 (US)
Inventors: CRAWFORD, Emmett, Dudley; (US).
PORTER, David, Scott; (US).
CONNELL, Gary, Wayne; (US)
Agent: BOSHEARS, Betty, J.; P.O. Box 511, Kingsport, Tennessee 37662-5075 (US)
Priority Data:
60/691,567 17.06.2005 US
60/731,389 28.10.2005 US
60/731,454 28.10.2005 US
60/738,869 22.11.2005 US
60/739,058 22.11.2005 US
60/750,547 15.12.2005 US
60/750,682 15.12.2005 US
60/750,692 15.12.2005 US
60/750,693 15.12.2005 US
Title (EN) POLYESTER COMPOSITIONS COMPRISING MINIMAL AMOUNTS OF 2, 2, 4, 4, -TETRAMETHYL-1, 3-CYCLOBUTANEDIOL
(FR) COMPOSITIONS DE POLYESTER COMPRENANT DES QUANTITES MINIMALES DE 2,2,4,4-TETRAMETHYL-1,3-CYCLOBUTANEDIOL
Abstract: front page image
(EN)Described are polyester compositions comprising (a) a dicarboxylicacidcomponent comprising terephthalic acid residues; optionally, aromatic dicarboxylic acid or aliphatic dicarboxylic acid residues; minimal amounts of 2,2,4,4-tetramethyl-1,3-cyclobutanediol residues; ethylene glycol, and optionally, 1,4-cyclohexanedimethanol residues.
(FR)L'invention concerne des compositions de polyester comprenant (a) a un composant d'acide dicarboxylique ayant des résidus d'acide téréphtalique ; éventuellement, des résidus d'acide dicarboxylique aromatique ou des résidus d'acide dicarboxylique aliphatique ; des quantités minimales de résidus de 2,2,4,4-tétraméthyl-1,3-cyclobutanediol ; de l'éthylèneglycol et éventuellement, des résidus de 1,4-cyclohexanediméthanol.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)