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1. (WO2007001036) POLYPHENYLENE SULFIDE RESIN STRUCTURE
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2007/001036 International Application No.: PCT/JP2006/312928
Publication Date: 04.01.2007 International Filing Date: 28.06.2006
Chapter 2 Demand Filed: 27.04.2007
IPC:
C08J 7/04 (2006.01) ,B32B 27/00 (2006.01) ,C08L 81/04 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
J
WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
7
Chemical treatment or coating of shaped articles made of macromolecular substances
04
Coating
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
27
Layered products essentially comprising synthetic resin
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
81
Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen, or carbon only; Compositions of polysulfones; Compositions of derivatives of such polymers
04
Polysulfides
Applicants:
大日本インキ化学工業株式会社 Dainippon Ink and Chemicals, Inc. [JP/JP]; 〒1748520 東京都板橋区坂下3丁目35番58号 Tokyo 35-58, Sakashita 3-chome, Itabashi-ku, Tokyo 1748520, JP (AllExceptUS)
オリジン電気株式会社 Origin Electric Company, Limited [JP/JP]; 〒1718555 東京都豊島区高田1丁目18番1号 Tokyo 18-1, Takada 1-chome, Toshima-ku, Tokyo 1718555, JP (AllExceptUS)
相澤 志文 AIZAWA, Shifumi [JP/JP]; JP (UsOnly)
島屋 卓 SHIMAYA, Taku [JP/JP]; JP (UsOnly)
岡部 敬三 OKABE, Keizo [JP/JP]; JP (UsOnly)
長野 知広 NAGANO, Tomohiro [JP/JP]; JP (UsOnly)
Inventors:
相澤 志文 AIZAWA, Shifumi; JP
島屋 卓 SHIMAYA, Taku; JP
岡部 敬三 OKABE, Keizo; JP
長野 知広 NAGANO, Tomohiro; JP
Agent:
志賀 正武 SHIGA, Masatake; 〒1048453 東京都中央区八重洲2丁目3番1号 Tokyo 2-3-1, Yaesu Chuo-ku Tokyo 1048453, JP
Priority Data:
2005-18822928.06.2005JP
Title (EN) POLYPHENYLENE SULFIDE RESIN STRUCTURE
(FR) STRUCTURE DE RESINE EN SULFURE DE POLYPHENYLENE
(JA) ポリフェニレンスルフィド樹脂構造体
Abstract:
(EN) A polyphenylene sulfide resin structure characterized by comprising: a molded article (A) of a polyphenylene sulfide resin material (a) comprising a polyphenylene sulfide resin (a1); and a coating film layer (B) formed on the surface of the molded article (A) by applying a coating material containing as a solid ingredient a chlorinated polyolefin resin (b1) having a chlorine content of 20-45 mass%.
(FR) L'invention concerne une structure de résine en sulfure de polyphénylène, caractérisée en ce qu'elle comprend : un article moulé (A) à partir d'un matériau de résine de sulfure de polyphénylène (a) comprenant une résine de sulfure de polyphénylène (a1) ; et une couche d'un film de revêtement (B) formée sur la surface de l'article moulé (A) en appliquant un matériau de revêtement contenant, en tant qu'ingrédient solide, une résine polyoléfine chlorée (b1) présentant une teneur en chlore comprise entre 20 et 45 % en poids.
(JA)  ポリフェニレンスルフィド樹脂(a1)を含むポリフェニレンスルフィド樹脂材料(a)の成形品(A)と、該成形品(A)の表面に、塩素原子含有率20~45質量%の塩素化ポリオレフィン樹脂(b1)を固形分として含有する塗料を塗布してなる塗膜層(B)が形成されていることを特徴とする、ポリフェニレンスルフィド樹脂構造体。                                                                           
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020080016869EP1911793US20090118405JP4094659