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1. (WO2007000890) IMAGE POSITION MEASURING APPARATUS AND EXPOSURE APPARATUS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2007/000890 International Application No.: PCT/JP2006/311880
Publication Date: 04.01.2007 International Filing Date: 13.06.2006
IPC:
G03F 9/00 (2006.01) ,G01B 11/00 (2006.01) ,G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
9
Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
G PHYSICS
01
MEASURING; TESTING
B
MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11
Measuring arrangements characterised by the use of optical means
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
富士フイルム株式会社 FUJIFILM Corporation [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome Minato-ku, Tokyo 1068620, JP (AllExceptUS)
上村 寛 UEMURA, Hiroshi [JP/JP]; JP (UsOnly)
福井 隆史 FUKUI, Takashi [JP/JP]; JP (UsOnly)
Inventors:
上村 寛 UEMURA, Hiroshi; JP
福井 隆史 FUKUI, Takashi; JP
Agent:
中島 淳 NAKAJIMA, Jun; 〒1600022 東京都新宿区新宿4丁目3番17号 HK新宿ビル7階 太陽国際特許事務所 Tokyo TAIYO, NAKAJIMA & KATO Seventh Floor, HK-Shinjuku Bldg. 3-17, Shinjuku 4-chome, Shinjuku-ku Tokyo 1600022, JP
Priority Data:
2005-18804428.06.2005JP
Title (EN) IMAGE POSITION MEASURING APPARATUS AND EXPOSURE APPARATUS
(FR) DISPOSITIF DE MESURE DE POSITION D'IMAGE ET DISPOSITIF D'EXPOSITION
(JA) 画像位置計測装置及び露光装置
Abstract:
(EN) An image position measuring apparatus is provided with a photographing unit, which includes an imaging element and/or a lens and measures the position of a reference mark formed on a work; and a correcting unit for correcting distortion of the imaging element and/or the lens. An exposure apparatus is provided with the image position measuring apparatus and an exposure unit which performs exposure to the work corresponding to the image data corrected based on the positional information of the reference mark photographed by the image position measuring apparatus. Influence of the distortion of the imaging element and the lens can be eliminated, and accuracy of measuring the position of the reference mark given to the work can be improved.
(FR) La présente invention concerne un dispositif de mesure de position d'image doté d'une unité de prise de vue, qui comprend un élément d'imagerie et/ou une lentille et mesure la position d'une marque repère formée sur un ouvrage, et d'une unité de correction qui corrige la distorsion de l'élément d'imagerie et/ou de la lentille. Un dispositif d'exposition est muni du dispositif de mesure de position d'image et d'une unité d'exposition qui réalise l'exposition à l'ouvrage correspondant aux données d'image corrigées en fonction des données de position de la marque repère capturée par le dispositif de mesure. On élimine ainsi les effets de la distorsion de l'élément d'imagerie et/ou de la lentille tout en améliorant l'exactitude de mesure de la position de la marque repère formée sur l'ouvrage.
(JA)  画像位置計測装置は、撮像素子及び/又はレンズ含み、ワークに形成された基準マークの位置を計測するための撮影ユニットと、前記撮像素子及び/又はレンズの歪みを補正する補正ユニットとを備える。露光装置が、画像位置計測装置と、画像位置計測装置によって撮影された前記基準マークの位置情報に基づいて補正された画像データにより前記ワークを露光する露光ユニットとを備える。撮像素子やレンズの歪みによる影響を回避でき、ワークに付与されている基準マークの位置計測精度の向上が図れる。
front page image
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020080019016US20090092288CN101203810