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1. WO2006127638 - LOW OFF-GASSING POLYURETHANES

Publication Number WO/2006/127638
Publication Date 30.11.2006
International Application No. PCT/US2006/019803
International Filing Date 22.05.2006
Chapter 2 Demand Filed 23.03.2007
IPC
C09J 175/04 2006.1
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
175Adhesives based on polyureas or polyurethanes; Adhesives based on derivatives of such polymers
04Polyurethanes
C08K 3/04 2006.1
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
KUSE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS
3Use of inorganic substances as compounding ingredients
02Elements
04Carbon
C09J 5/08 2006.1
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
5Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
08using foamed adhesives
B01D 46/00 2006.1
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
DSEPARATION
46Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
CPC
B01D 2239/0407
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
DSEPARATION
2239Aspects relating to filtering material for liquid or gaseous fluids
04Additives and treatments of the filtering material
0407comprising particulate additives, e.g. adsorbents
B01D 39/1676
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
DSEPARATION
39Filtering material for liquid or gaseous fluids
14Other self-supporting filtering material ; ; Other filtering material
16of organic material, e.g. synthetic fibres
1669Cellular material
1676of synthetic origin
C08G 2101/00
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
2101Manufacture of cellular products
C08K 3/04
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
KUse of inorganic or non-macromolecular organic substances as compounding ingredients
3Use of inorganic substances as compounding ingredients
02Elements
04Carbon
C08L 75/04
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
75Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
04Polyurethanes
H05K 3/284
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
3Apparatus or processes for manufacturing printed circuits
22Secondary treatment of printed circuits
28Applying non-metallic protective coatings
284for encapsulating mounted components
Applicants
  • ENTEGRIS, INC. [US]/[US] (AllExceptUS)
  • MASTROBUONO, Elviro, James [US]/[US] (AllExceptUS)
  • GAUDREAU, John, C. [US]/[US] (AllExceptUS)
Inventors
  • MASTROBUONO, Elviro, James
  • GAUDREAU, John, C.
Agents
  • CARROLL, Alice, O.
Priority Data
60/684,19323.05.2005US
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) LOW OFF-GASSING POLYURETHANES
(FR) POLYURETHANNES A FAIBLE DEGAZEMENT
Abstract
(EN) A low out-gassing polyurethane is described for use in applications where contaminants must be kept to very low levels, such as during lithography. In particular, the polyurethane is essentially free of silicon-containing species, which present particular contamination problems in the context of electronic device manufacturing. The polyurethane may be utilized as a potting material in filter assemblies, or in other contexts within the environment of electronics manufacturing. Testing of the novel polyurethane formulation shows the off-gassing characteristics to be much lower than commercially available potting materials made from polyethylene.
(FR) L'invention concerne un polyuréthanne à faible dégazement destiné à une utilisation dans des applications dans lesquelles des contaminants doivent être maintenus à de très faibles niveaux, comme pendant une lithographie. Le polyuréthanne est notamment essentiellement exempt d'espèces contenant du silicium, lesquelles présentent des problèmes particuliers de contamination dans un contexte de fabrication de dispositifs électroniques. Ce polyuréthanne peut être utilisé en tant que matériau d'enrobement pour des assemblages de filtres, ou dans d'autres contextes, dans un milieu de fabrication d'appareils électroniques. Les tests effectués sur cette nouvelle formulation de polyuréthanne montrent que les caractéristiques de dégazement sont nettement inférieures à celles des matériaux d'enrobement disponibles dans le commerce, fabriqués à partir de polyéthylène.
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