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1. (WO2006124552) METHOD OF FORMING A PHOTORESIST ELEMENT

Pub. No.:    WO/2006/124552    International Application No.:    PCT/US2006/018361
Publication Date: Nov 23, 2006 International Filing Date: May 12, 2006
IPC: G03C 1/76
Applicants: MICROCHEM CORP.
JOHNSON, Donald, W.
Inventors: JOHNSON, Donald, W.
Title: METHOD OF FORMING A PHOTORESIST ELEMENT
Abstract:
A method of forming a photoresist element comprising the steps of: preparing a hot melt photoresist mixture; applying the photoimageable hot melt composition to a film substrate using a slot die coating system; cooling the hot melt sufficiently to prevent flow; and applying a protective cover film to the opposite surface of the partially cooled composition, thereby forming a photoresist element.